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Ion-beam exposure on PAM surface according to molecular concentration for application to liquid-crystal device

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Abstract

This study investigated the modification effects of ion-beam exposure on polyacrylamide films according to molecular concentrations. Surface morphological examination using scanning electron microscopy showed increasing polyacrylamide particle size and film thicknesses with increasing concentrations. X-ray photoelectron spectroscopy and contact angle analysis were used to confirm the surface chemical reconstruction and increased surface energy after ion-beam exposure. As the molecular concentration increased, the changes were also observed to increase. The anisotropic ion-beam exposure induced strong van der Waals interactions with the liquid-crystals, leading to their uniform alignment. The uniform and homogeneous liquid-crystal alignment state was confirmed by polarized optical microscopy and pretilt angle analysis. Electro-optical performance evaluations showed the high potential of the ion-beam-exposed polyacrylamide film for use in liquid-crystal devices. Therefore, the correlation between the film molecular concentration and the IB process is successfully verified, and its applicability to liquid-crystal devices is confirmed.

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The data that support the findings of this study are available from the corresponding author upon reasonable request.

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Funding

This research was supported by the National Research Foundation of Korea (Grant No. 2022R1F1A106419212).

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Authors and Affiliations

  1. Department of Electrical and Electronic Engineering, Jeonju University, 303 Cheonjam-ro, Wansan-gu, Jeonju, Jeollabuk-do, 55069, Republic of Korea

    Dong Wook Lee

  2. IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering, Yonsei University, Seodaemun-gu, Seoul, 120-749, Republic of Korea

    Dong Hyun Kim, Jin Young Oh, Jonghoon Won, Da Bin Yang & Dae-Shik Seo

  3. Electrical Engineering, Changwon National University, 20 changwondaehak-ro, Uichang-gu, Changwon, Gyeonnam, 51140, Republic of Korea

    Hae-Chang Jeong

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  1. Dong Wook Lee
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Contributions

DWL contributed to writing-original draft. DHK contributed to methodology. JYO contributed to measurement, JW contributed to material preparation. DBY contributed to investigation. HCJ contributed to formal analysis. DSS contributed to administration.

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Correspondence to Hae-Chang Jeong or Dae-Shik Seo.

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Lee, D.W., Kim, D.H., Oh, J.Y. et al. Ion-beam exposure on PAM surface according to molecular concentration for application to liquid-crystal device. J Mater Sci: Mater Electron 34, 1102 (2023). https://doi.org/10.1007/s10854-023-10523-6

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  • DOI: https://doi.org/10.1007/s10854-023-10523-6

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