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The influences of current density on chemical composition and magnetic properties of FeNix film prepared by electrodeposition

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Abstract

Soft magnetic film with high saturation magnetization (Ms) and low coercivity (Hc) is a critical class of material for RF inductors, which can enhance the inductance when inserted into film inductor. In this study, a series of micron-scale FeNix film are prepared via an electroplating process. The phase and element composition of the as-prepared FeNix films are analyzed through the X-ray diffraction (XRD) and energy dispersive spectroscopy (EDS), respectively. Results demonstrate that the iron nickel ratio of FeNix films can be adjusted by controlling the current density. The higher current density caused high nickel content, which may controllably prepare a series of micro-scale FeNix film. Moreover, SEM images and AFM photograph show that the films have no obvious defects and have a small roughness. We also found that the micron-scale FeNix film (~ 2.5 μm) presents high saturation magnetization (Ms = 1289.0 emu/cm3) and low coercivity (Hc = 76.8 A/m), which is feasible for magnetic core of RF inductors. Also, the electroplating method that preparing micro-scale FeNix film with controllable elemental composition can provide a referential experience for other soft magnetic film.

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The data that support the findings of this study are available on request from the corresponding author.

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Acknowledgements

The authors are grateful to the Project of 9th Institute of China Electronics Technology Group Corporation (No. 2022SK-007), and the Funded by the Project of State Key Laboratory of Environment-friendly Energy Materials, Southwest University of Science and Technology (No. 20fksy23,21fksy27), and supported by Sichuan Science and Technology Plan (No. 2021YFG0223).

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Authors and Affiliations

  1. State Key Laboratory of Environment-Friendly Energy Materials, Southwest University of Science and Technology, Mianyang, 621010, China

    Shuyuan Tang, Qingqing Nie, Hang Chen, Jiaxing Liu, Yue Zhang, Fang Xu, Bo Dai & Yong Ren

  2. 9th Institute of China Electronics Technology Group Corporation, Mianyang, 621010, China

    Jun Li

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  1. Shuyuan Tang
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  2. Qingqing Nie
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  3. Hang Chen
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  4. Jiaxing Liu
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  5. Yue Zhang
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  8. Jun Li
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  9. Yong Ren
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Contributions

ST: Conceptualization, Methodology, Formal analysis, Resources, Data Curation, Writing—Original Draft. QN: Investigation, Formal analysis. HC: Investigation. JL: Investigation. YZ: Investigation. BD: Supervision. FX: Formal analysis, Writing—Review & Editing. JL: Funding acquisition. YR: Resources, Supervision, Writing—Review & Editing.

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Correspondence to Yong Ren.

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Tang, S., Nie, Q., Chen, H. et al. The influences of current density on chemical composition and magnetic properties of FeNix film prepared by electrodeposition. J Mater Sci: Mater Electron 34, 530 (2023). https://doi.org/10.1007/s10854-023-09888-5

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