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Influence of MoS2 film thickness for nitric oxide gas sensing applications

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Abstract

Contemporary material research is more significant for societal progress. There are several materials accessible in this environment. Among them, certain materials have excellent sensing characteristics for specific gases. According to the literature, two-dimensional materials exhibit unique features that pique the interest of researchers. Molybdenum disulphide (MoS2) is a well-known two-dimensional transition metal dichalcogenide material with exceptional structural and compositional features. These characteristics can be used to detect gases. The effect of MoS2 thickness on nitric oxide gas sensing has been demonstrated in the present work. In the current study, thin films of MoS2 having thicknesses of 20 nm, 40 nm, and 60 nm were deposited by the utilization of radiofrequency (13.56 MHz) sputtering. Scanning electron microscopy and X-ray diffraction were used to study the morphological and structural aspects of the deposited MoS2 films. While these films are examined with nitric oxide, the 60-nm film detects the NO gas with remarkable sensitivity at 40 °C with a response time of 16 s. The results will be discussed.

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Acknowledgements

I want to thank Dr. D.N.N. Murty, Associate Professor, HOD Electrical Department, IIT Tirupati, for giving permission to utilize equipment needed to complete the experimental work.

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The authors declare that no funds, grants, or other support was received during the preparation of this manuscript.

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Author notes

  1. Yellareswara Rao Kosuri

    Present address: Centre for Materials for Electronics Technology, Hyderabad, Telangana, 500051, India

Authors and Affiliations

  1. Department of Electronics and Instrumentation Engineering, V.R. Siddhartha Engineering College, Vijayawada, Andhra Pradesh, 520007, India

    Prasanti Korapati

  2. Department of Instrument Technology, Andhra University College of Engineering(A), Visakhapatnam, Andhra Pradesh, 530003, India

    Prasanti Korapati, A. Kamala Kumari & Venkata Rama Koti Reddy Dodda

  3. Vignan’s Institute of Information Technology, Visakhapatnam, Andhra Pradesh, 530049, India

    Yellareswara Rao Kosuri

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  1. Prasanti Korapati
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Contributions

PK, AKK, YRK, VRKRD did conceptualization. PK, AKK, YRK, VRKRD performed methodology, formal analysis and investigation, writing—original draft preparation, and writing—review and editing. AKK and VRKRD supervised the study.

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Correspondence to Prasanti Korapati.

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Korapati, P., Kumari, A.K., Kosuri, Y.R. et al. Influence of MoS2 film thickness for nitric oxide gas sensing applications. J Mater Sci: Mater Electron 34, 72 (2023). https://doi.org/10.1007/s10854-022-09432-x

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