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Confocal magnetron sputtering deposition of Cu/AZO bilayer structures: effect of Cu thickness on microstructural and optoelectronic properties

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Abstract

A promising research approach is currently oriented toward the investigation of multilayer films, consisting of the combination of metal elements and Al-doped ZnO (AZO) films for potential future applications. In this context, we focus on the preparation, characterization and film thickness effects on different properties of Cu/AZO bilayers. Hence, a multi-source RF magnetron sputtering deposition system in confocal configuration, under optimized conditions, was used to successfully deposit Cu/AZO bilayers on glass substrates with increasing Cu thickness, up to 13 nm, and a constant AZO thickness of 65 nm. The structural, morphological, electrical, optical and luminescent properties of all samples were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV–vis spectroscopy, Hall effect and photoluminescence (PL) techniques. The obtained results indicated that all the samples show a würtzite hexagonal structure with a preferential orientation in the axis c (002). The homogeneity of Cu layers is obtained for 10 and 13 nm thicknesses, and the optical properties are strongly affected by the existence of Cu. Moreover, increasing Cu thickness leads to (i) an improvement of structural and electrical (resistivity, mobility and carrier density) properties, (ii) a decrease in transmittance, (iii) a widening of the optical gap, and (iv) a variation of UV–violet emission intensity. These very interesting results are of great importance for understanding the behavior of Cu/AZO bilayers, which form a milestone for future potential applications in coatings and photovoltaics.

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Authors and Affiliations

  1. Laboratoire de Physique des Matériaux, Université 8 Mai 1945, 24000, Guelma, Algeria

    N. E. A. Doghmane & S. Chettibi

  2. Laboratoire des Sciences des Procédés et des Matériaux, UPR CNRS 3407, Université Sorbonne Paris Nord, Paris, France

    F. Challali

  3. Laboratoire de Génie de l’Environnement, Université de Bejaia, 06000, Bejaïa, Algeria

    A. Chelouche

  4. Laboratoire des Semi-conducteurs, Université Badji Mokhtar-Annaba, 23000, Annaba, Algeria

    T. Touam

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  1. N. E. A. Doghmane
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NEAD, SC, FC, AC were involved in investigation; TT contributed to Writing—original draft.

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Doghmane, N.E.A., Chettibi, S., Challali, F. et al. Confocal magnetron sputtering deposition of Cu/AZO bilayer structures: effect of Cu thickness on microstructural and optoelectronic properties. J Mater Sci: Mater Electron 33, 26717–26727 (2022). https://doi.org/10.1007/s10854-022-09338-8

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