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Atomic layer deposition of TiO2 thin films on glass fibers for enhanced photocatalytic activity

Journal of Materials Science: Materials in Electronics volume 33, pages 18002–18013 (2022)Cite this article

Abstract

Photocatalytic wastewater treatment is expected to become a sustainable way of eliminating toxic chemicals. Due to the surface-driven mechanism of the photocatalysis, surface area of the catalyst material plays a crucial role in the efficiency of the process, which is usually achieved by nanoparticles. However, using powder materials introduces a new problem: removing the catalyst materials out of clean water. As an alternative, atomic layer deposition (ALD) can form conformal thin films on high surface area substrates providing an immobilization route with high photocatalytic activity. Textile materials are inexpensive and accessible therefore good candidates for the substrate materials. Here, we deposit thin films on TiO2 on fiberglass fabrics and investigate the photocatalytic activity. Since the as-deposited ALD TiO2 films are amorphous, they have very limited photocatalytic activity. Upon thermal treatment of the films after deposition, photocatalytic activity is achieved. After four hours of exposure to the solar simulator and UV lamp, TiO2-coated fibers demonstrated much higher photocatalytic activity than films on planar substrates previously described in the literature. The photocatalytic activity and structure of the coated fibers were investigated using XRD, XPS, UV–Vis, and PL analyses.

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Data availability

The data that support the findings of this study are available from the corresponding author upon reasonable request.

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Acknowledgements

The authors acknowledge the generous funding support for this study in part from Bursa Uludag University (Grant # OUAP(MH)-2018/7) and the Scientific and Technological Research Council of Turkey (TUBITAK) (Grant Nos. # 118M617 and 218M275).

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Authors and Affiliations

  1. Department of Textile Engineering, Bursa Uludag University, Görükle, 16059, Bursa, Turkey

    Shafiqul Islam & Halil I. Akyildiz

  2. UNAM-National Nanotechnology Center, Bilkent University, 06800, Ankara, Turkey

    Halil I. Akyildiz

Authors
  1. Shafiqul Islam
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  2. Halil I. Akyildiz
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The manuscript was written through the contributions of both authors. All authors have given approval to the final version of the manuscript.

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Correspondence to Halil I. Akyildiz.

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Islam, S., Akyildiz, H.I. Atomic layer deposition of TiO2 thin films on glass fibers for enhanced photocatalytic activity. J Mater Sci: Mater Electron 33, 18002–18013 (2022). https://doi.org/10.1007/s10854-022-08661-4

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  • DOI: https://doi.org/10.1007/s10854-022-08661-4