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Physical investigations of vanadium oxide thin films on p-Si substrate

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Abstract

In this study, vanadium oxide coated thin films on the p-Si substrate were prepared by the sol–gel method using V2O5 powder as a precursor. The crystal structures, surface morphology, and content of the films were investigated by XRD, SEM, AFM, and EDX analysis, respectively. Metal–oxide–semiconductor (MOS) structures were fabricated on the p-Si wafer and the electrical properties of those were obtained from current–voltage (I-V) and capacitance–voltage (C–V) measurements. As a result of XRD analysis, V8O15 and V3O7 structure peaks were observed in the films. The frequency and voltage-dependent capacitance measurements for MOS structures showed that the capacitance decreased with increasing frequency. The main electrical parameters for instance diode ideality factor (n), barrier height (ΦB), series resistance (RS) of the MOS structure were determined from the current–voltage (I–V) characteristics and compared in detail with thermionic emission theory, Norde and Cheung methods.

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Data availability

The datasets generated and analyzed during the current study are available from the corresponding author on reasonable request.

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Acknowledgements

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The author did not receive support from any organization for the submitted work.

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Authors and Affiliations

  1. Department of Physics, Faculty of Sciences and Arts, Batman University, Batman, Turkey

    Y. Bilgen & O. Pakma

  2. Faculty of Education, Erciyes University, Kayseri, Turkey

    I. A. Kariper

  3. Department of Physics, Faculty of Science, Muğla Sıtkı Koçman University, Muğla, Turkey

    S. Ozden

Authors
  1. Y. Bilgen
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  2. O. Pakma
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  3. I. A. Kariper
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  4. S. Ozden
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Contributions

YB: Conceptualization, methodology, data collection and analysis, writing-reviewing and editing OP: supervision, data collection and analysis, reviewing and editing. IAK: methodology. Data collection and analysis ŞÖ: data analysis, writing-reviewing and editing.

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Correspondence to O. Pakma.

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Bilgen, Y., Pakma, O., Kariper, I.A. et al. Physical investigations of vanadium oxide thin films on p-Si substrate. J Mater Sci: Mater Electron 33, 16263–16271 (2022). https://doi.org/10.1007/s10854-022-08519-9

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