Abstract
RF magnetron sputtering was used to grow silicon nitride (Si3N4) thin film on GaAs substrate to form metal–oxide–semiconductor (MOS) capacitor. Complex dielectric permittivity (ε*), complex electric modulus (M*) and complex electrical conductivity (σ*) of the prepared Au/Si3N4/p-GaAs (MOS) capacitor were studied in detail. These parameters were calculated using admittance measurements performed in the range of 150 K-350 K and 50 kHz-1 MHz. It is found that the dielectric constant (ε′) and dielectric loss (ε″) value decrease with increasing frequency. However, as the temperature increases, the ε′ and ε″ increased. Ac conductivity (σac) was increased with increasing both temperature and frequency. The activation energy (Ea) was determined by Arrhenius equation. Besides, the frequency dependence of σac was analyzed by Jonscher’s universal power law (σac = Aωs). Thus, the value of the frequency exponent (s) were determined.
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15 July 2021
The original article has been updated due to author’s open access cancellation
23 July 2021
A Correction to this paper has been published: https://doi.org/10.1007/s10854-021-06621-y
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Acknowledgements
This study was supported by Gazi University Scientific Research Project. (Project Number: GU-BAP.05/2019-26).
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Türkay, S., Tataroğlu, A. Complex dielectric permittivity, electric modulus and electrical conductivity analysis of Au/Si3N4/p-GaAs (MOS) capacitor. J Mater Sci: Mater Electron 32, 11418–11425 (2021). https://doi.org/10.1007/s10854-021-05349-z
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DOI: https://doi.org/10.1007/s10854-021-05349-z