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Magnetoresistance of nanocomposite copper/carbon thin films

  • Ali ArmanEmail author
  • Carlos Luna
  • Mohsen Mardani
  • Fatemeh Hafezi
  • Amine Achour
  • Azin AhmadpourianEmail author
Article

Abstract

Nanocomposite thin films made of partially oxidized Cu nanoparticles embedded into hydrogenated amorphous carbon, with different thicknesses and Cu/C ratio, were prepared by means of radio frequency plasma enhanced chemical vapor deposition and radio frequency sputtering using acetylene gas and copper target. The surface roughness was investigated using atomic force microscopy, revealing the fractal geometry of the Cu/carbon thin films at the nanoscale with fractal dimensions around 2.7. In addition, the electrical properties of these films and their dependence on the application of low magnetic fields were explored at room temperature. It was found that when the Cu nanoparticles are separated by gaps, the electrical conduction is governed by tunneling effects. In these conditions, the samples exhibit negative magnetoresistance values, displaying steps in the dependences on the magnetic field. These properties suggest the potential use of these films as magnetic sensors in spintronics.

Keywords

Atomic Force Microscopy Fractal Dimension Negative Magnetoresistance Radio Frequency Plasma Nanocomposite Thin Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  1. 1.Vacuum Technology GroupACECR Sharif BranchTehranIran
  2. 2.Universidad Autónoma de Nuevo LeónSan Nicolás de los GarzaMexico
  3. 3.Institut National de la Recherche Scientifique (INRS)VarennesCanada
  4. 4.Department of Physics, Kermanshah BranchIslamic Azad UniversityKermanshahIran

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