Double-textured ZnO:Al films obtained by a one-step etching method for enhanced light trapping
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Double-textured ZnO:Al (AZO) transparent conducting films with good optoelectronic characteristics and enhanced light trapping ability were prepared by a method including deposition, etching and re-deposition, and only one-step etching process was adopted during the whole process. The effects of the one-step etching method on the structural and optoelectronic properties, surface morphology and light trapping ability of double-textured AZO films were studied systematically. Double-textured films were covered with uniformly and distinctly crater-like textured structure after the re-deposition. And double-textured AZO films exhibited higher haze values compared with the single-textured films. Effective enhancement of light trapping was obtained from the double-textured AZO films by the one-step etching method.
KeywordsLight Trapping Front Electrode Transparent Conducting Film Diffuse Transmittance Transparent Conducting Oxide Film
This work was supported by the National Natural Science Foundations of China (Grant Nos. 61404070, 61504017 and 51472039), the Science Research Project of Education Department of Liaoning Province (Grant No. L2014116), the Program for Liaoning Excellent Talents in University (No. LR2015010), the Higher Specialized Research Fund for the Doctoral Program (Grant No. 20122124110004), the Project of Open Research Foundation of State Key Laboratory of Advanced Technology for Float Glass (No. KF1301-01), and the Anshan Science and Technology Planning Project of China (Grant No. 1840).