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Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties

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Abstract

Transparent antireflective SiO2/TiO2 double layer thin films were prepared using a sol–gel method and deposited on glass substrate by spin coating technique. Thin films were characterized using XRD, FE-SEM, AFM, UV–Vis spectroscopy and water contact angle measurements. XRD analysis reveals that the existence of pure anatase phase TiO2 crystallites in the thin films. FE-SEM analysis confirms the homogeneous dispersion of TiO2 on SiO2 layer. Water contact angle on the thin films was measured by a contact angle analyzer under UV light irradiation. The photocatalytic performance of the TiO2 and SiO2/TiO2 thin films was studied by the degradation of methylene blue under UV irradiation. The effect of an intermediate SiO2 layer on the photocatalytic performance of TiO2 thin films was examined. SiO2/TiO2 double layer thin films showed enhanced photocatalytic activity towards methylene blue dye.

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Acknowledgments

This research work was supported by a Grant (14CTAP-C077607-01) from Infrastructure and transportation technology promotion research program funded by Ministry of Land, Infrastructure, and Transport of the Korean government.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, University of Seoul, Seoul, 02504, South Korea

    Hemraj M. Yadav & Jung-Sik Kim

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  1. Hemraj M. Yadav
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  2. Jung-Sik Kim
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Correspondence to Jung-Sik Kim.

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Yadav, H.M., Kim, JS. Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties. J Mater Sci: Mater Electron 27, 10082–10088 (2016). https://doi.org/10.1007/s10854-016-5082-4

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  • DOI: https://doi.org/10.1007/s10854-016-5082-4

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