Abstract
This work reports on passivation effect of solar-grade multicrystalline Si (mc-Si) using a TiO2/porous silicon double coating. For this purpose, TiO2 nanoparticles were deposited onto porous silicon (PS)/mc-Si using pulsed laser ablation of titanium target. The structural and optoelectronic properties of the TiO2/PS treated mc-Si substrates were investigated by X-ray diffraction, Raman spectroscopy, optical spectrometry, photo-conductance and photoluminescence (PL). It was found that the minority carrier lifetime (τ eff) of the mc-Si wafer could enhance at a nominal thickness of the TiO2 film (nanoparticle sizes). This was attributed to a surface passivation of the mc-Si wafer via TiO2-passivation of the PS film, whose PL intensity improves consequently. An optimal TiO2 thickness of 80 nm was found to give the highest PL intensity and an enhancement of the minority carrier lifetime from 5 µs for untreated mc-Si wafer to about 391 µs for a TiO2/PS treated wafers.
Similar content being viewed by others
References
W.C. Hsu, Y.S. Lu, J.Y. Chyan, J.A. Yeh, Int. J. Photoenergy (2012). doi:10.1155/2012/197514
G. Dingemans, M.M. Mandoc, S. Bordihn, M.C.M. van de Sanden, W.M.M. Kessels, Appl. Phys. Lett. 98, 222102 (2011)
M. Ben Rabha, W. Dimassi, M. Gaidi, H. Ezzaouia, B. Bessais, Phys. Status Solidi 8, 1874 (2011)
M. Kaminski, K. Bass, G. Claudio, J.M. Walls, Appl. Surf. Sci. 301, 51–55 (2014)
A. Angelescu, I. Kleps, M. Miu, M. Simion, T. Ignat, S. Petrescu, N. Moldovan, C. Paduraru, A. Raducanu, Rev. Adv. Mater. Sci. 5, 440 (2003)
K.J. Kim, G.S. Kim, J.S. Hong, T.S. Kang, D. Kim, Sol. Energy 64, 61 (1998)
V.Y. Yerokhov, I.L. Melnyk, Renew. Sustain. Energy Rev. 3, 291 (1999)
A. Hajjaji, M. Ben Rabha, N. Janene, M. Gaidi, B. Bessais, M.S. El Khakani, Appl. Surf. Sci. 258(20), 8046–8048 (2012)
C.H. Liang, Y. Shimizu, T. Sasaki, N. Koshizaki, Appl. Phys. A 80, 819 (2005)
M.Z. Rahman, Int. J. Renew. Energy Res. 2(1), 117 (2012)
L. Remachea, E. Fourmonda, A. Mahdjoubb, J. Dupuisa, M. Lemitia, Mater. Sci. Eng., B 176, 45–48 (2011)
M. Ben Rabha, M. Saadoun, M.F. Boujmil, B. Bessais, H. Ezzaouia, R. Bennaceur, Appl. Surf. Sci. 252, 488–493 (2005)
M. Gaidi, M. Chaker, P.F. Ndione, R. Morandotti, B. Bessaïs, J. Appl. Phys. 101, 063107 (2007)
A. Guinier, Théorie et Technique de la Radiocristallographie (Dunod, Paris, 1964), p. 462
P.A. Temple, C.E. Hathaway, Multiphonon Raman spectrum of silicon. Phys. Rev. B 7, 3685 (1973)
D.B. Dimitrov, I. Savationova, E. Liarokapis, Opto-Electron. Rev. 6(4), 295–298 (1998)
M. Fusia, E. Maccallini, T. Caruso, C.S. Casari, A. Li Bassi, C.E. Bottani, P. Rudolf, K.C. Prince, R.G. Agostino, Surf. Sci. 605, 333–340 (2011)
L.G.J. De Haart, G. Blasse, J. Solid State Chem. 61, 135 (1986)
Z. Yuan, L. Zhang, Chem. J. Chin. Univ. (in Chi-nese) 20, 1007 (1999)
Y. Li, C. Song, Y. Wang, Y. Wei, Y. Wei, Y. Hu, Luminescence 22, 540 (2007)
D.C. Pan, N.N. Zhao, Q. Wang, S. Jiang, X. Ji, L. An, Adv. Mater. 17, 176 (2005)
N. Serpone, D. Lawless, R. Khairutdinovt, J. Phys. Chem. 99, 16646–16654 (1995)
Y. Lei, L.D. Zhang, G.W. Meng, G.H. Li, X.Y. Zhang, C.H. Liang, W. Chen, S.X. Wang, Appl. Phys. Lett. 78, 1125 (2001)
M.H. Brodsky, M. Cardona, J.J. Cuomo, Phys. Rev. B 16, 3556 (1997)
Z.H. Xiong, L.S. Liao, S. Yuan, Z.R. Yang, X.M. Ding, X.Y. Hou, Thin Solid Films 388, 271 (2001)
R. Ricchiardi, A. Damin, S. Bordiga, C. Lamberti, G. Spano, F. Rivetti, A. Zecchina, J. Am. Chem. Soc. 123, 11409 (2001)
S. Klein, S. Thorimbert, W.F. Meier, J. Catal. 163, 476 (1996)
L. Derbali, H. Ezzaouia, Appl. Surf. Sci. 271, 234–239 (2013)
N. Janene, A. Hajjaji, M. Ben Rabha, B. Bessais, M.A. El Khakani, M. Gaidi. Sciencejet C 1(12), (2012)
K.J. Kim, G. Kim, J. Suphong, B. Bessais, T.K.D. Kim, Sol. Energy 64, 61–66 (1998)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Janene, N., Salem, M., Ben Rabha, M. et al. TiO2/porous silicon nanocomposite passivation coating for mc-Si wafers. J Mater Sci: Mater Electron 26, 1585–1590 (2015). https://doi.org/10.1007/s10854-014-2579-6
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-014-2579-6