Abstract
In this paper, patterning ability of ultra-thin films of conducting polypyrrole deposited on silicon wafer surfaces by in situ chemical polymerization in the presence of different anionic dopants including α-naphthalene sulfonic acid, anthraquinone-2-sulfonic acid sodium salt monohydrate/5-sulfosalicylic acid dehydrate and camphor sulfonic acid has been studied. “Lift-off process” combined with photolithography is the used method for large-area and easy fabrication of micro patterns of conducting PPy thin films. In this procedure, a self-assembled mono layer of Py-silane is deposited on a patterned surface of a positive photoresist, followed by immersion of the surface into polymerization solution. After polymerization, positive micro pattern of the conducting PPy thin film appears on the surface by lifting-off the post baked positive photo resist by THF. The results showed deposition and patterning of conducting PPy thin films with nanometer thickness and relatively high range of conductivity with features as small as 3–4.5 µm in lateral dimensions on silicon wafer.
Similar content being viewed by others
References
M. Wan, Conducting Polymers with Micro or Nanometer Structure (Springer, Berlin, 2008)
A. Eftekhari, Nanostructured Conductive Polymers (Wiley, London, 2010)
G.G. Wallace, G.M. Spinks, L.A.P. Kane-Maguire, P.R. Teasdale, Conductive Electroactive Polymers, Intelligent Polymer Systems, 3rd edn. (CRC Press, Boca Raton, 2009)
L. Xia, Z. Wei, M. Wan, J. Colloid Interface Sci. 341, 1 (2010)
T. Deepshikha, Basu. Anal. Lett. 44, 1126 (2011)
K.S. Schanze, T.S. Bergstedt, B.T. Hauser, Adv. Mater. 8, 531 (1996)
S. Holdcroft, Adv. Mater. 13, 1753 (2001)
M.S. Lee, Ha.S. Kang, Hy.S. Kang, J. Joo, A.J. Epstein, J.Y. Lee. Thin Solid Films 477, 169 (2005)
Z. Huang, P.-C. Wang, A.G. MacDiarmid, Y. Xia, G. Whitesides, Langmuir 13, 6480 (1997)
Y.-T. Tao, K. Pandian, W.-C. Lee, Langmuir 14, 6158 (1998)
A.N. Grace, K. Pandian, Curr. Sci. 85, 374 (2003)
F. Zhou, Z. Liu, B. Yu, M. Chen, J. Hao, W. Liu, Q. Xue, Surf. Sci. 561, 1 (2004)
F. Guan, M. Chen, W. Yang, J. Wang, R. Zhang, S. Yang, Q. Xue, Appl. Surf. Sci. 230, 131 (2004)
A. Errachid, D. Caballero, E. Crespo, F. Bessueille, M. Pla-Roca, C.A. Mills, F. Teixidor, J. Samitier, Nanotechnology 18, 485301 (2007)
M. Yun, N.V. Myung, R.P. Vasquez, C. Lee, E. Menke, R.M. Penner, Nano Lett. 4, 419 (2004)
K. Ramanathan, M.A. Bangar, M. Yun, W. Chen, A. Mulchandani, N.V. Myung, Nano Lett. 4, 1237 (2004)
A. Das, C.H. Lei, M. Elliott, J.E. Macdonald, M.L. Turner, Org. Electron. 7, 181 (2006)
A.K. Wanekaya, M.A. Bangar, M. Yun, W. Chen, N.V. Myung, A. Mulchandani, J. Phys. Chem. C 111, 5218 (2007)
C. Marck, K. Borgwarth, J. Heinze, Adv. Mater. 13, 47 (2001)
C. Marck, K. Borgwarth, J. Heinze, Chem. Mater. 13, 747 (2001)
B.W. Maynor, S.F. Filocamo, M.W. Grinstaff, J. Liu, J. Am. Chem. Soc. 124, 522 (2002)
S.-Y. Jang, M. Marquez, G.A. Sotzing, J. Am. Chem. Soc. 126, 9476 (2004)
W.M. Choi, O.O. Park, Curr. Appl. Phys. 6, 695 (2006)
Y. Lu, G. Shen, C. Zhao, S. Guo, Electrochim. Acta 54, 4253 (2009)
T. Yao, X. Li, Q. Lin, W. Jie, Z. Ren, C. Wang, J. Zhang, K. Yu, B. Yang, Polymer 50, 3938 (2009)
J.S. Choi, K.Y. Cho, J.-H. Yim, Eur. Polym. J. 46, 389 (2010)
S.H.M. Persson, P. Dyreklev, O. Inganas, Adv. Mater. 8, 405 (1996)
M.S.A. Abdou, Z.W. Xie, A.M. Leung, S. Holdcroft, Synth. Metals 52, 159 (1992)
M. Schrodner, R.-I. Stohn, K. Schultheis, S. Sensfuss, H.-K. Roth, Org. Electron. 6, 161 (2005)
D.A. Pardo, G.E. Jabbour, N. Peyghambarian, Adv. Mater. 12, 1249 (2000)
Y. Yoshioka, G.E. Jabbour, Synth. Metals 156, 779 (2006)
A. Morrin, O. Ngamna, E. O’Malley, N. Kent, S.E. Moulton, G.G. Wallace, M.R. Smyth, A.J. Killard, Electrochim. Acta 53, 5092 (2008)
F. Zhang, T. Nyberg, O. Inganas, Nano Lett. 2, 1373 (2002)
C.C. Cedeno, J. Seekamp, A.P. Kam, T. Hoffmann, S. Zankovych, C.M.S. Torres, C. Menozzi, M. Cavallini, M. Murgia, G. Ruani, F. Biscarini, M. Behl, R. Zentel, J. Ahopelto, Microelectron. Eng. 61–62, 25 (2002)
B. Dong, N. Lu, M. Zelsmann, N. Kehagias, H. Fuchs, C.M.S. Torres, L.F. Chi, Adv. Funct. Mater. 16, 1937 (2006)
D. Cheyns, K. Vasseur, C. Rolin, J. Genoe, J. Poortmans, P. Heremans, Nanotechnology 19, 424016 (2008)
L. Jiang, X. Wang, L. Chi, Small 7, 1309 (2011)
J.K. Avlyanov, H.H. Kuhn, J.Y. Josefowicz, A.G. MacDiarmid, Synth. Met. 84, 153 (1997)
P.-C. Wang, J.-Y. Yu, React. Funct. Polym. 72, 311 (2012)
M. Mahmoodian, B. Pourabbas, S. Mohajerzadeh, Thin Solid Films (2014, under review)
M. El-Sherif, L. Bansal, J. Yuan, Sensors 7, 3100 (2007)
K.T. Song, J.Y. Lee, H.D. Kim, D.Y. Kim, S.Y. Kim, C.Y. Kim, Synth. Metals 110, 57 (2000)
E.J. Oh, K.S. Jang, J.S. Suh, H. Kim, K.H. Kim, C.H. Yo, J. Joo, Synth. Metals 84, 147 (1997)
H. Masuda, D.K. Asano, Synth. Met. 135–136, 43 (2003)
M.-K. Song, Y.-T. Kim, B.-S. Kim, J. Kim, K. Char, H.-W. Rhee, Synth. Metals 141, 315 (2004)
Y. Xia, J.M. Wiesinger, A.G. MacDiarmid, A.J. Epstein, Chem. Mater. 7, 443 (1995)
Y. Xia, A.G. MacDiarmid, A.J. Epstein, Macromolecules 27, 7212 (1994)
K.S. The, Y. Takahashi, Z. Yao, Y.-W. Lu, Sens. Actuators, A 155, 113 (2009)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Mahmoodian, M., Pourabbas, B., Hosseini, M. et al. Patterning ability of conducting polypyrrole thin films by positive photoresist. J Mater Sci: Mater Electron 26, 898–908 (2015). https://doi.org/10.1007/s10854-014-2480-3
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-014-2480-3