Abstract
Electrical characterisations of Mesitylene-2-boronic acid (MBA), Phenylboronic acid (PBA) and 1-Naphthylboronic acid (NBA) are investigated using C-f and I–V measurements. All materials are used to fabricate Langmuir–Blodgett (LB) thin film by vertical dipping method. Metal/LB film/Metal sandwich structure is prepared to investigate electrical properties of boron containing LB films. For evaluation of electrical measurements, the theoretical thickness is determined using ChemDraw software and experimental thickness value is calculated from surface plasmon resonance (SPR) curves. Dielectric measurements are used to determine the dielectric constant (ε) and to compare refractive index value which is determined from SPR results. The values of ε are determined as 2.79, 2.70, 2.82 for MBA, PBA and NBA respectively. The refractive indexes of three materials are calculated to be around 1.6. I–V results are used to study the conduction mechanism of these LB films. The low voltage region shows an ohmic characteristic for each LB film and conductivity values are calculated as 0.55 × 10−11 S m−1, 0.42 × 10−11 S m−1 and 3.62 × 10−11 S m−1 for MBA, PBA and NBA respectively. In the high voltage region of I–V curves that show Schottky type conduction mechanisms with the barrier heights estimated for each LB film as 0.77, 0.79 and 0.76 eV respectively.
Similar content being viewed by others
References
S. Qin, Z. Wua, Z. Tang, Y. Song, F. Zeng, D. Zhao, Sens. Actuators B 66, 240–242 (2000)
C.L. Recksiedler, B.A. Deore, M.S. Freund, Langmuir 21, 3670–3674 (2005)
X.L. Chen, B.H. Xu, J.M. Xue, Y. Zhao, C.C. Wei, J. Sun, Thin Solid Films 515, 3753–3759 (2007)
J.H. Lee, J.S. Yi, K.J. Yang, J.H. Park, R.D. Oh, Thin Solid Films 431, 344–348 (2003)
M. Özer, A. Altındal, A.R. Ozkaya, M. Bulut, Ö. Bekaroğlu, Synth. Met. 155, 222–231 (2005)
T. Kojima, D. Kumaki, J. Nishida, S. Tokito, Y. Yamashita, J. Mater. Chem. 21, 6607–6613 (2011)
B.A. Deore, I. Yu, J. Woodmass, M.S. Freund, Macromol. Chem. Phys. 209, 1094–1105 (2008)
S. Liu, L. Bakovic, A. Chen, J. Electroanal. Chem. 591, 210–216 (2006)
H. Yaoa, F. Changa, N. Hu, Electrochim. Acta 55, 9185–9192 (2010)
F. Yakuphanoglu, B.F. Şenkal, Polym. Eng. Sci. 49, 722–726 (2009)
P.G. Vázquez, O.G.M. Saavedra, G. Pelzl, G. Bañuelos, M.P.C. Castro, Thin Solid Films 517, 1770–1777 (2009)
R. Capan, Z. Özbek, H. Göktas, S. Sen, F.G. Ince, M.E. Özel, Sens. Actuators B 148, 358–365 (2010)
G. Bussetti, A. Violante, R. Yivlialin, S. Cirilli, B. Bonanni, P. Chiaradia, J. Phys. Chem. C 115, 8189–8194 (2011)
Y. Acıkbas, M. Evyapan, T. Ceyhan, R. Capan, Ö. Bekaroglu, Sens. Actuators B 135, 426–429 (2009)
C. Venet, C. Pearson, A.S. Jombert, M.F. Mabrook, D.A. Zeze, M.C. Petty, Colloids Surf. A Physicochem. Eng. Asp. 354, 113–117 (2010)
R. Capan, F. Davis, Mater. Chem. Phys. 125, 883–886 (2011)
M. Pietraszkiewicz, P. Prus, O. Pietraszkiewicz, Tetrahedron 60, 10747–10752 (2004)
R. Ludwig, Y. Shiomi, S. Shinka, Langmuir 10, 3195–3200 (1994)
T. Miyahara, K. Kurihara, J. Am. Chem. Soc. 126, 5684–5685 (2004)
J.C. Anderson, H. Namlı, Synlett 7, 765–766 (1995)
J.C. Anderson, H. Namli, C.A. Roberts, Tetrahedron 53, 15123–15134 (1997)
A.K. Hassan, A.V. Nabok, A.K. Ray, A. Lucke, K. Smith, C.J.M. Stirling, F. Davis, Mater. Sci. Eng. C 8–9, 251–255 (1999)
J.N. Wilde, J. Nagel, M.C. Petty, Thin Solid Films 327, 726–729 (1998)
A.K. Ray, O. Omar, C.S. Bradley, N.A. Bell, D.J. Simmonds, C.S. Thorpe, R.A. Broughton, Vacuum 57, 253–258 (2000)
A.V. Nabok, A.K. Hassan, A.K. Ray, O. Omar, V.I. Kalchenko, Sens. Actuators B 45, 115–121 (1997)
A.V. Nabok, A.K. Hassan, A.K. Ray, Mater. Sci. Eng. C 8–9, 505–508 (1999)
R. Capan, T.H. Richardson, D. Lacey, Thin Solid Films 415, 236–241 (2002)
R. Capan, I. Alp, T.H. Richardson, F. Davis, Mater. Lett. 59, 1945–1948 (2005)
N. Tekin, C. Tarimci, Opt. Laser Technol. 38, 498–505 (2006)
A.K. Hassan, C. Goy, A.V. Nabok, Thin Solid Films 516, 9006–9011 (2008)
Z. Ozbek, R. Capan, H. Goktas, S. Sen, F.G. Ince, M.E. Ozel, F. Davis, Sens. Actuators B 158, 235–240 (2011)
Y. Etou, T. Tai, T. Sugiyama, T. Sugino, Diam. Relat. Mater. 11, 985–988 (2002)
H. Aoki, T. Masuzumi, M.Z. Lu, D. Watanebe, C. Kimura, T. Sugino, Diam. Relat. Mater. 19, 1437–1440 (2010)
R. Capan, A.K. Ray, A.K. Hassan, Thin Solid Films 515, 3956–3961 (2007)
Z. Tu, M. Jing, J. Fu, J. Yuan, S. Wua, Q. Teng, Comput. Theor. Chem. 986, 1–5 (2012)
N.J. Geddes, J.R. Sambles, W.G. Parker, N.R. Couch, D.J. Jarvis, J. Phys. D Appl. Phys. 23, 95–102 (1990)
F.T. Reis, D. Mencaraglia, S.O. Saad, I. Seguy, M. Oukachmih, P. Jolinat, P. Destruel, J. Non-Cryst. Solids 338, 599–602 (2004)
V.I. Troitsky, T.S. Berzina, E. Dalcanale, M.P. Fontana, Thin Solid Films 405, 276–289 (2002)
I. Capan, T. Uzunoğlu, C. Tarımcı, T. Tanrısever, Thin Solid Films 516, 8975–8978 (2008)
T.W. Kim, H.S. Lee, D.H. Byun, D.Y. Kang, Thin Solid Films 331, 8–14 (1998)
H.S. Lee, D.S. Kim, J.W. Park, W.J. Lee, K.U. Jang, T.W. Kim, Y.S. Kwon, Thin Solid Films 499, 402–405 (2006)
Acknowledgments
M. Evyapan would like to thank to Turkish Scientific and Technological Research Council (TUBITAK) for the scholarship.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Evyapan, M., Çapan, R., Erdoğan, M. et al. Electrical conductivity properties of boron containing Langmuir–Blodgett thin films. J Mater Sci: Mater Electron 24, 3403–3411 (2013). https://doi.org/10.1007/s10854-013-1262-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-013-1262-7