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Improved quality of GaN epilayer grown on porous SiC substrate by in situ H2 pre-treatment

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Abstract

GaN epilayers were grown on the Si-terminated (0001) 6H-SiC substrates pre-treated by in situ H2 in metal organic chemical vapor deposition system. It was found that in situ H2 treatment brought a porous SiC surface. The influence of H2 pre-treatment conditions on SiC surface was carefully investigated. Moreover, our experiment demonstrated that the H2 pre-treatment can distinctly influence the GaN basic characteristics.

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Acknowledgments

Project supported by national natural science foundation of china (NO. 60976010, NO. 61076045, NO. 11004020), national high technology research and development program (863 program) (NO. 2011AA03A102), the fundamental research funds for the central universities (NO. DUT12LK22, DUT11LK43, DUT11RC(3)45), the research fund for the doctoral program of higher education (No. 20110041120045), the open fund of the state key laboratory of functional materials for informatics.

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Authors and Affiliations

  1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, 116024, People’s Republic of China

    Shiwei Song, Rensheng Shen, Hongwei Liang, Yang Liu, Xiaochuan Xia, Kexiong Zhang, Dongsheng Wang & Guotong Du

  2. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning Road, Shanghai, 200050, People’s Republic of China

    Hongwei Liang

  3. State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, People’s Republic of China

    Dechao Yang & Guotong Du

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  1. Shiwei Song
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  2. Rensheng Shen
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  3. Hongwei Liang
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  4. Yang Liu
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  5. Xiaochuan Xia
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  6. Kexiong Zhang
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  7. Dechao Yang
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  8. Dongsheng Wang
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  9. Guotong Du
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Correspondence to Rensheng Shen or Hongwei Liang.

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Song, S., Shen, R., Liang, H. et al. Improved quality of GaN epilayer grown on porous SiC substrate by in situ H2 pre-treatment. J Mater Sci: Mater Electron 24, 3299–3302 (2013). https://doi.org/10.1007/s10854-013-1246-7

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  • DOI: https://doi.org/10.1007/s10854-013-1246-7

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