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Influence of thin platinum layer on the magnetic properties of multiple layers of CVD cobalt thin films

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Abstract

This paper presents the results obtained on the multiple layers of cobalt (Co)/platinum (Pt) and cobalt (Co)/platinum (Pt)/cobalt (Co) on the oxidised silicon substrate. The cobalt layers were deposited by metal-organic chemical vapour deposition on oxidised-silicon substrates at 450 °C, in H2 ambient with 2-torr processing pressure. The platinum layers were deposited by E-beam evaporation in a separate vacuum system. The magnetic properties of Co/Pt/Co and Co/Pt multilayer were compared with the single cobalt layers of similar thicknesses on the oxidised silicon substrate. From the hysteresis loops it was observed that thin cobalt layers on oxidised-silicon substrate shows hard magnetic property with coercivity H c values of 360 Oe and 500 Oe respectively for the 30- and 15-nm cobalt layers. The multiple layers of Co/Pt/Co and Co/Pt of cobalt thickness 15- and 30-nm with platinum 1.5-nm spacer-layer show significant change in magnetic properties (i.e. coercivity H c and magnetisation M s ) and, gave soft magnetic properties with H c values 51 and 49 Oe respectively, which are significantly less than the H c values of single cobalt layers on oxidised silicon. Also, single and multiple layers cobalt with platinum were annealed and compared with the as-deposited layer structures. From the microstructure analysis by SEM, and AFM it was found that the single and multilayer had similar roughness. Magnetic images were observed by MFM and analyzed in terms of domain structure.

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References

  1. R.P. Cowburn, Mater. Today. 6(7–8), 32–38 (2003)

    Google Scholar 

  2. R.L. Comstock, J. Mat. Sci. Mater. Electron. 13, 509–523 (2002)

    Article  CAS  Google Scholar 

  3. D.C. Jiles, Acta Materialia. 51, 5907–5939 (2003)

  4. M.H. Phan, H.X. Peng, Progr. Mater. Sci. 53, 323–420 (2008)

    Article  Google Scholar 

  5. Z.H. Xiong, D. Wu, Z.V. Vardeny, J. Shi, Nature 427, 821–824 (2004)

    Google Scholar 

  6. M.N. Baibich et al., Phys. Rev. Lett. 61, 2472 (1988)

    Article  CAS  Google Scholar 

  7. J.S. Moodera, L.R. Kinder, T.M. Wong, R. Meservey, Phys. Rev. Lett. 74, 3273 (1995)

    Article  CAS  Google Scholar 

  8. S.S. Parkin et al., Proc. IEEE 91, 661 (2003)

    Article  CAS  Google Scholar 

  9. T. Suzuki, Scripta Metallurgica et Materialia 33, 1609–1623 (1995)

    Google Scholar 

  10. S. Hashimoto, Y. Ochiai, J. Magn. Mater. 88, 221–226 (1990)

    Article  Google Scholar 

  11. T. Som, S. Ghosh, J.K. Tripathi, R. Grötzschel, M. Mäder, V. Ganesan, A. Gupta, D. Kanjilal, Nucl. Instrum. Methods Phys. Res. B 266(8), 1542–1547 (2008)

    Article  CAS  Google Scholar 

  12. Z.Y. Liu, L. Yue, D.J. Keavney, S. Adenwalla, Phys. Rev. B 70, 224423-1-10 (2004)

    Google Scholar 

  13. Z.Y. Liu, F. Zhang, H.L. Chen, B. Xu, D.L. Yu, J.L. He, Y.J. Tian, Phys. Rev. B 79(2), 024427 (2009)

    Article  Google Scholar 

  14. G.J. Kusinskia, G. Thomas, G. Denbeaux, K.M. Krishnan, B.D. Terris, J. Appl. Phys. 91(10), 7541–7543 (2002)

    Article  Google Scholar 

  15. D. Weller, L. Folks, M. Best, E.E. Fullerton, B.D. Terris, G.J. Kusinski, K.M. Krishnan, G. Thomas, J. Appl. Phys. 89(11), 7525–7527 (2001)

    Article  CAS  Google Scholar 

  16. S.E. Russek, W.E. Bailey, IEEE Trans. Magn. 36(5), 2990–2992 (2000)

    Article  CAS  Google Scholar 

  17. J.K. Tripathi, B. Satpati, M.O. Liedke, A. Gupta, T. Som, J. Magn. Magn. Mater. 32, 3464–3469 (2010)

    Article  Google Scholar 

  18. K.E. Seshan, Handbook of Thin-Film Deposition Processes and Techniques: Principles, Methods, Equipments and Applications, 2nd edn. (William Andrew Publishing/Noyes, Norwich, 2002)

  19. H.O. Pierson, Handbook of Chemical Vapor Deposition (CVD)—Principles, Technology and Applications, 2nd edn. (William Andrew Publishing/Noyes, NY, 1999)

    Google Scholar 

  20. N. Deo, J.R. Brewer, C.E. Reinhardt, R.J. Nikolić, C.L. Cheung, J. Vac. Sci. Technol. B 26(4), 1309–1314 (2008)

    Article  CAS  Google Scholar 

  21. M.A. Hussein, J. He, IEEE Trans. Semicond. Manuf. 18, 69 (2005)

    Article  Google Scholar 

  22. D.P. Adams, T.M. Mayer, B.S. Swartzentruber, Appl. Phys. Lett. 68(16), 2210 (1996)

    Google Scholar 

  23. N. Deo, M.F. Bain, J.H. Montgomery, H.S. Gamble, in Proceedings of 203rd ECS Meeting, “CVD XVI and EURO-CVD 14”, Paris, pp. 1008–1015 (2003)

  24. N. Deo, M.F. Bain, J.H. Montgomery, H.S. Gamble, J. Mat. Sci. Mater. Electron. 16, 387–392 (2005)

    Article  CAS  Google Scholar 

  25. N. Deo, M.F. Bain, J.H. Montgomery, H.S. Gamble, J. Appl. Phys. 97, 10N307 (2005)

  26. E.W. Soo, J.P. Wang, C.J. Sun, Y.F. Xu, T.C. Chong, G.M. Chow, J. Magn. Magn. Mater. 235, 93–97 (2001)

    Article  CAS  Google Scholar 

  27. A.G. Roy, D.E. Laughlin, J. Appl. Phys. 91(10), 8076–8078 (2002)

    Article  CAS  Google Scholar 

  28. L. Lu, J. Young, M. Wu, C. Mathieu, M. Hadley, P. Krivosik, N. Mo, Appl. Phys. Lett. 100(2), 022403 (2012)

    Article  Google Scholar 

  29. L.L. Lee, B.K. Cheong, D.E. Laughlin, D.N. Lambeth, Appl. Phys. Lett. 67(24), 3638–3640 (1995)

    Article  CAS  Google Scholar 

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Acknowledgments

We thank to Seagate Technology (UK & Ireland) for the use of VSM, AFM and MFM measurements respectively during the sponsored project.

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Authors and Affiliations

  1. Northern Ireland Semiconductor Research Centre, School of Electrical and Electronic Engineering and Computer Science, The Queen’s University of Belfast, Belfast, BT7 1NN, UK

    Nirmalendu Deo, Michael F. Bain, John H. Montgomery & Harold S. Gamble

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  1. Nirmalendu Deo
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  2. Michael F. Bain
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  4. Harold S. Gamble
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Correspondence to Nirmalendu Deo.

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Deo, N., Bain, M.F., Montgomery, J.H. et al. Influence of thin platinum layer on the magnetic properties of multiple layers of CVD cobalt thin films. J Mater Sci: Mater Electron 23, 1881–1886 (2012). https://doi.org/10.1007/s10854-012-0678-9

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  • DOI: https://doi.org/10.1007/s10854-012-0678-9

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