Abstract
Highly transparent and conductive aluminum-doped zinc oxide (AZO) thin films were successfully deposited on glass by DC magnetron sputtering. The effects of Al-doping content (1–4 at.%), substrate temperature (250–350 °C) and ultraviolet (UV)-ozone treatment time (0–20 min) on AZO film work function were systematically investigated. It was revealed that the AZO work function increased with the decrease of Al content, while it was almost insensitive to the substrate temperature. Moreover, the UV-ozone treatment significantly improved AZO work function, while the post-treatment time had no effect on AZO work function. Two factors, [OZnAl]/([Zn] + 1.5[Al]) ratio and carbon contamination on film surface, affected the AZO work function. It was suggested that AZO films with high [OZnAl]/([Zn] + 1.5[Al]) ratio and reduced carbon concentration, possessed high work function.
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H. Kim, C.M. Gilmore, A. Piqu’e, J.S. Horwitz, H. Mattoussi, H. Murata, Z.H. Kafari, D.B. Chrisey, J. Appl. Phys. 86, 6451 (1996)
S. Seki, Y. Sawada, T. Nishide, Thin Solid Films 388, 22 (2001)
H.T. Cao, C. Sun, Z.L. Pei, A.Y. Wang, L.S. Wen. J. Mater. Sci. Electron. 15, 169 (2004)
L. Zhao, Z. Zhou, H. Peng, R. Cui, Appl. Surf. Sci. 252, 385 (2005)
K.T. Kamtekar, A.P. Monkman, M.R. Bryce, Adv. Mater. 22, 572 (2010)
A.R. Schlatmann, D.W. Floet, A. Hilberer, F. Garten, P.J.M. Smulders, T.M. Klapwijk, G. Hadziioannou, Appl. Phys. Lett. 69, 1764 (1996)
C.L. Chao, K.R. Chuang, S.A. Chen, Appl. Phys. Lett. 69, 2894 (1996)
S.T. Lee, Z.Q. Gao, L.S. Hung, Appl. Phys. Lett. 75, 1404 (1999)
H. Kim, C.M. Gilmore, J.S. Horwitz, A. Piqu’e, H. Murata, G.P. Kushto, R. Schlaf, Z.H. Kafafi, D.B. Chrisey, Appl. Phys. Lett. 76, 259 (2000)
T. Minami, S. Suzuki, T. Miyata, Thin Solid Films 398–399, 53 (2001)
X. Jiang, F.L. Wong, M.K. Fung, S.T. Lee, Appl. Phys. Lett. 83, 1875 (2003)
G.B. Murdoch, S. Hinds, E.H. Sargent, S.W. Tsang, L. Mordoukhovski, Z.H. Lub, Appl. Phys. Lett. 94, 213301 (2009)
J.H. Park, K.J. Ahn, K.I. Park, S.I. Na, H.K. Kim, J. Phys. D Appl. Phys. 43, 115101 (2010)
S.H.K. Park, J.I. Lee, C.S. Hwang, H.Y. Chu, Jpn. J. Appl. Phys. 44, 242 (2005)
T.W. Kim, D.C. Choo, Y.S. No, W.K. Choi, E.H. Choi, Appl. Surf. Sci. 253, 1917 (2006)
A. Klein, C. Körber, A. Wachau, F. Säuberlich, Y. Gassenbauer, R. Schafranek, S.P. Harvey, T.O. Mason, Thin Solid Films 518, 1197 (2009)
W. Wang, Q. Feng, K. Jiang, J. Huang, X. Zhang, W. Song, R. Tan, Appl. Surf. Sci. 257, 3884 (2011)
K.H. Kim, K.Ch. Park, D.Y. Ma, J. Appl. Phys. 81, 7764 (1997)
W.J. Jeong, S.K. Kim, G.C. Park, Thin Solid Films 506–507, 180 (2006)
C. Li, M. Furuta, T. Matsuda, T. Hiramatsu, H. Furuta, T. Hirao, Thin Solid Films 517, 3265 (2009)
S. Chen, C. Yu, Y. Lin, W. Xie, T. Hsu, D.P. Tsal, J. Appl. Phys. 104, 114314 (2008)
Acknowledgment
The authors appreciate financial supports of National Natural Science Foundation of China (20975107, 60806032), “Hundred Talents Program” and “Solar Action Program” of Chinese Academy of Sciences, Science and Technology Innovative Research Team of Ningbo Municipality (Grant No. 2009B21005), CAS/SAFEA International Partnership Program for Creative Research Teams, “Seeding Project” of Ningbo Institute of Material Technology and Engineering of Chinese Academy of Sciences, Zhejiang Natural Science Foundation (Y4100169), and Ningbo Natural Science Foundation (2010A610166).
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Feng, Q., Wang, W., Jiang, K. et al. Effect of deposition condition and UV-ozone post-treatment on work function of DC magnetron sputtered AZO thin films. J Mater Sci: Mater Electron 23, 267–272 (2012). https://doi.org/10.1007/s10854-011-0400-3
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DOI: https://doi.org/10.1007/s10854-011-0400-3