Abstract
GaN layers grown by metal organic vapour phase epitaxy on sapphire were imaged by synchrotron radiation X-ray topography. The threading dislocations could not be resolved in the topographs due to their high density, but a smaller density of about 105 cm−2 defects were seen in the interface between GaN and sapphire by utilizing large-area back-reflection topography for the sapphire substrates. The misfit dislocation images in the topographs form a well-resolved cellular network, in which the average cell size is roughly 30 μm. Different cell shapes in the misfit dislocation networks are observed on different samples. Also, images of small-angle grains of similar size were found in transmission section topographs of the GaN layers.
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Acknowledgements
This work was supported by the European Community - Research Infrastructure Action under the FP6 "Structuring the European Research Area" Programme (through the Integrated Infrastructure Initiative "Integrating Activity on Synchrotron and Free Electron Laser Science".) M. Odnoblyudov and V. Bougrov acknowledge support by RFBR and Dynasty Foundation. Also, we would like to thank Dr. C. Paulmann for his assistance at HASYLAB beamline F1 Topography.
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Lankinen, A., Lang, T., Suihkonen, S. et al. Dislocations at the interface between sapphire and GaN. J Mater Sci: Mater Electron 19, 143–148 (2008). https://doi.org/10.1007/s10854-007-9307-4
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DOI: https://doi.org/10.1007/s10854-007-9307-4