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The origin of electron beam patterning in silver/amorphous chalcogenide bilayers

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Abstract

Previous studies of the effects of the interaction of electron beams with bilayers of amorphous chalcogenides and metals such as silver and copper have shown that the type of pattern formed by electron beams scanned across these bilayers is dependent on the energy of the electron beam and on the thickness of the bilayer. Whether these bilayers are freestanding or are deposited on a substrate has also been shown to be important. The purpose of this investigation is to develop a model to explain how the electron-beam energy and bilayer thickness as well as the physical processes produced by the electron beam can lead to different types of pattern. These processes include radiolysis, secondary electron generation and the formation of superionic silver chalcogenide phases. With high electron-beam energies and thin freestanding bilayers, these processes are central to the formation of the metal-free patterns generated in thin freestanding bilayers in a scanning transmission electron microscope. Silver patterning on the surface of thick bilayer films in a scanning electron microscope using less energetic electron beams has also been shown to depend on a mechanism involving the neutralising of silver ions produced by radiolysis with secondary electron generation. This model has also been used to explain the dependence of the type of pattern formed on the incident electron energy when silver/amorphous chalcogenide bilayers of a thickness suitable for X-ray mask production are exposed to an electron beam with energies over the 5–30 keV range.

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References

  1. Freeman LA, Shaw RF, Yoffe AD (1969) An electron microscope study of the diffusion of metals in amorphous arsenic triselenide films. Thin Solid Films 3:367–376

    Article  Google Scholar 

  2. Fitzgerald AG (1981) A study of the interaction of copper and silver with amorphous As2S3 films. In: P Brederoo P, Boom G (eds) Electron Microscopy 1980: Physics, Proceedings of the 7th European Congress on Electron Microscopy, vol. 1. The Hague, The Netherlands, August 24–29 pp 354–355

  3. Fitzgerald AG (1982) Electron diffraction studies of contact reactions in amorphous As2S3 thin films. Thin Solid Films 98:101–107

    Article  Google Scholar 

  4. McHardy CP, Fitzgerald AG, Moir PA, Flynn M (1987) The dissolution of metals in amorphous chalcogenides and the effects of electron and ultraviolet radiation. J Phys C 20:4055–4075

    Article  Google Scholar 

  5. Oldale JM, Elliot SR (1993) Reversible electron-beam writing on a submicron scale in a superionic amorphous film. Appl Phys Lett 63:1801–1803

    Article  Google Scholar 

  6. Fitzgerald AG and Mietzsch K (1998) A study of amorphous chalcogenides by electron microscopy and analysis, in: Bailey GW, Alexander KB, Jerome WG, Bond MG, McCarthy JJ, (Eds.), Microscopy and Microanalysis Atlanta, Georgia, USA, July 12-16 1998, Microscopy Society of America and Microbeam Analysis Society Joint Conference, Proceedings of Microscopy and Microanalysis 1998. 4(2): 714-715

  7. Romero JS, Fitzgerald AG, Mietzsch K (2001) Electron beam induced patterns in Ag/GeS4. J Optoelectron Adv M 3(3):649–654

    Google Scholar 

  8. Chen AS, Addiego G, Leung GW and Neureuther AR, (1986) Electron beam investigation and use of Ge-Se inorganic resist. J Vacuum Sci Technol B 4(1):398–402

  9. Yoshida N, Tanaka K (1997) Direct fabrication of microrelief patterns by electron-beam exposure in Ag-As-S glasses. Appl Phys Lett 70(6):779–781

    Article  Google Scholar 

  10. Debnath RK, Fitzgerald AG, Nusbar N (2006) Electron beam fabrication of masks in amorphous metal-chalcogenide bilayers. In: Brown PD, Baker RW, Hamilton B (eds) EMAG-NANO 2005: 31 August–2 September 2005, Institute of Physics Conference Series, vol. 26, University of Leeds, UK. IOP Publishing, Bristol, pp 211–214

  11. Nusbar N, Fitzgerald AG, Debnath RK, Persheyev S (2003) Electron beam nanofabrication of amorphous chalcogenide-metal masks. In: McVitie S, McComb D (eds) Proceedings of the Institute of Physics Electron Microscopy and Analysis Group Conference EMAG 2003, Institute of Physics Conference Series, vol. 179, University of Oxford UK, 3–5 Sept 2003. IOP Publishing, Bristol, pp 375–377

  12. Mietzsch K, Fitzgerald AG (2001) Transmission electron microscopy on metal-amorphous chalcogenide films. In: Aindow M, Kiely CJ (eds) Electron Microscopy and Analysis Group Conf. EMAG2001, Institute of Physics Conference Series, vol. 168. University of Dundee, UK, 5–7 September, 2001. IOP Publishing, Bristol, pp 477–480

  13. Fitzgerald AG, Nusbar N, Persheyev S (2003) Amorphous chalcogenide/metal bilayers—a new X-ray mask material, in: Wyborn B (ed) Central Laser Facility Annual Report 2002/2003 151–152, Lasers for Science Facility Programme, Central Laser Facility, Rutherford Appleton Laboratory, UK. http://www.clf.rl.ac.uk

  14. McHardy CP, Fitzgerald AG, and Flynn M (1987) Electron-beam-induced silver diffusion in amorphous chalcogenides. In: Brown LM (ed) Electron microscopy and analysis 1987, Institute of Physics Conference Series, vol 90. Adam Hilger, Bristol, pp 167–170

  15. Mietzsch K, Fitzgerald AG (2000) Electron-beam-induced patterning of thin film arsenic-based chalcogenides. Appl Surf Sci 162–163:464–468

    Article  Google Scholar 

  16. Seiler HJ (1983) Secondary electron emission in the scanning electron microscope. J Appl Phys 54(11):R1–R18

    Article  Google Scholar 

  17. Salow H (1940) Sekundarelektronen-emission. Phys Z 41:434–442

    Google Scholar 

  18. Dekker AJ (1957) Solid state physics. Englewood Cliffs, New Jersey

    Google Scholar 

  19. Bethe HA (1941) On the production of secondary electrons. Phys Rev 59:940–941

    Google Scholar 

  20. Lin Y, Joy DC (2005) A new examination of secondary electron yield data. Surf Interface Anal 37:895–900

    Article  Google Scholar 

  21. Young JR (1956) Penetration of electrons in aluminum oxide films. Phys Rev 103:292–293

    Article  Google Scholar 

  22. Reimer L (1989) Transmission electron microscopy, physics of image formation and microanalysis, 2nd edn., Optical sciences Springer, Berlin

    Book  Google Scholar 

  23. Fitzgerald AG, McHardy CP (1985) Electron spectroscopy and diffraction studies of metal contact reactions in amorphous chalcogenides. Surf Sci 162:568–578

    Article  Google Scholar 

  24. Kanaya K, Okayama S (1972) Penetration and energy-loss theory of electrons in solid targets. J Phys D 5:43–58

    Article  Google Scholar 

  25. Fitting H-J (2004) Six laws of low-energy electron scattering in solids. J Electron Spectrosc 136:265–272

    Article  Google Scholar 

  26. Hobbs LW (1983) Radiation effects in analysis by TEM. In: Chapman JN, Craven AJ (eds.) Quantitative electron microscopy, Proc. 25th Scottish Universities Summer School in Physics, Glasgow, August 1983. Scottish Universities Summer School in Physics, Edinburgh

  27. Mott NF, Gurney RW (1948) Electronic processes in ionic crystals, 2nd edn. Dover Publications Inc., New York

    Google Scholar 

  28. Andreoni W (1981) Microscopic model of β-Ag2S. Solid State Commun 38:837–839

    Article  Google Scholar 

  29. Saito Y, Sato M, Shiojiri M (1981) Fine structure of gold particles in thin films prepared by metal-insulator co-sputtering. Thin Solid Films 79:257–266

    Article  Google Scholar 

  30. Bowden BF (2007) Design, theory, materials selection and fabrication of hollow core waveguides for infrared to THz radiation. Ph.D. Dissertation Rutgers, The State University of New Jersey, USA

Download references

Acknowledgements

I wish to thank SERC and EPSRC for the award of research Grants GR/F92978 and GR/N14682, respectively, that supported a major part of this research. I also wish to acknowledge that the conclusions put forward here regarding the physical processes involved in explaining the various electron beam-induced patterns are based on earlier experimental observations in my work with my co-researchers C.P. McHardy, M. Flynn, P.A. Moir, S.M. Potrous, A.E Ploessl, K. Mietzsch, N. Nusbar, J.S. Romero, R.K. Debnath and S. Persheyev.

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  1. Carnegie Laboratory of Physics, School of Engineering, Physics and Mathematics, University of Dundee, Dundee, DD1 4HN, UK

    A. G. Fitzgerald

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  1. A. G. Fitzgerald
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Fitzgerald, A.G. The origin of electron beam patterning in silver/amorphous chalcogenide bilayers. J Mater Sci 50, 2626–2633 (2015). https://doi.org/10.1007/s10853-015-8849-8

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