Preparation of amorphous TiS x thin film electrodes by the PLD method and their application to all-solid-state lithium secondary batteries
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Titanium sulfide thin film electrodes were prepared by the pulsed laser deposition method using a KrF excimer laser. Thin films of various compositions were prepared under several deposition conditions such as Ar gas pressure, laser fluence, and target-substrate distance. The thickness of the titanium sulfide thin film prepared under Ar gas pressure of 0.01 Pa, the pulse energy of 200 mJ/pulse, and the distance of 5 cm between the target and the substrate was ca. 400 nm. The films prepared at room temperature showed no peaks in the XRD pattern and no periodic lattice fringe in high-resolution transmission electron microscopic images, suggesting that they were amorphous. An all-solid-state cell using a TiS4.0 thin film electrode formed on a pelletized Li2S–P2S5 glass–ceramic electrolyte showed the reversible capacity of 543 mAh g−1, which was higher than that of a cell using a TiS1.7 film. The former solid-state cell retained higher capacity for 20 cycles at room temperature.
KeywordsPulse Laser Deposition LiFePO4 P2S5 TiS2 Thin Film Electrode
This research was financially supported by Japan Science and Technology Agency (JST), Core Research for Evolutional Science and Technology (CREST) project.
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