Journal of Materials Science

, Volume 47, Issue 18, pp 6601–6606 | Cite as

Preparation of amorphous TiSx thin film electrodes by the PLD method and their application to all-solid-state lithium secondary batteries

  • Takuya Matsuyama
  • Atsushi Sakuda
  • Akitoshi Hayashi
  • Yoshihiko Togawa
  • Shigeo Mori
  • Masahiro Tatsumisago
Article

Abstract

Titanium sulfide thin film electrodes were prepared by the pulsed laser deposition method using a KrF excimer laser. Thin films of various compositions were prepared under several deposition conditions such as Ar gas pressure, laser fluence, and target-substrate distance. The thickness of the titanium sulfide thin film prepared under Ar gas pressure of 0.01 Pa, the pulse energy of 200 mJ/pulse, and the distance of 5 cm between the target and the substrate was ca. 400 nm. The films prepared at room temperature showed no peaks in the XRD pattern and no periodic lattice fringe in high-resolution transmission electron microscopic images, suggesting that they were amorphous. An all-solid-state cell using a TiS4.0 thin film electrode formed on a pelletized Li2S–P2S5 glass–ceramic electrolyte showed the reversible capacity of 543 mAh g−1, which was higher than that of a cell using a TiS1.7 film. The former solid-state cell retained higher capacity for 20 cycles at room temperature.

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Copyright information

© Springer Science+Business Media, LLC 2012

Authors and Affiliations

  • Takuya Matsuyama
    • 1
  • Atsushi Sakuda
    • 1
  • Akitoshi Hayashi
    • 1
  • Yoshihiko Togawa
    • 2
  • Shigeo Mori
    • 3
  • Masahiro Tatsumisago
    • 1
  1. 1.Department of Applied Chemistry, Graduate School of EngineeringOsaka Prefecture UniversityOsakaJapan
  2. 2.Nanoscience and Nanotechnology Research CenterOsaka Prefecture UniversityOsakaJapan
  3. 3.Department of Materials Science, Graduate School of EngineeringOsaka Prefecture UniversityOsakaJapan

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