Abstract
Epitaxial Ni–Mn–Ga films have been grown onto heated substrates by sputtering. Their chemical composition depends on the sputtering argon pressure. Representative epitaxial films of Ni52.3Mn26.8Ga20.9, 0.5 μm-thick, transform martensitically at about 120 °C, accompanied by sharp changes in the lattice parameter and resistivity, and orders ferromagnetically below 98°. The observed high transformation temperature, orthorhombic martensitic structure, twinning mode and film morphology, indicate a potential multifunctional behavior of the film, such as high-temperature shape-memory effect and magnetic field actuation.
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Acknowledgements
The financial support from the Department of Education, Basque Government (Project ETORTEK No. IE10-272), and the Spanish Ministry of Science and Innovations (Project No. MAT2008 06542-C04-02) is acknowledged. The discussions with Prof. G. Jakob about twinning crystallography are very much appreciated. Authors are very grateful to M. Pini and G.Carcano for technical support.
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Aseguinolaza, I.R., Orue, I., Svalov, A.V. et al. Fabrication conditions and transformation behavior of epitaxial Ni–Mn–Ga thin films. J Mater Sci 47, 3658–3662 (2012). https://doi.org/10.1007/s10853-011-6212-2
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DOI: https://doi.org/10.1007/s10853-011-6212-2