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Effect of Nb concentration on the structure, mechanical, optical, and electrical properties of nano-crystalline Ti1−x Nb x N thin films

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Abstract

The structure, mechanical, optical, and electrical properties of Ti1−x Nb x N thin films, 0 ≤ x ≤ 1, are reported. The films were deposited onto polycrystalline nuclear grade 316LN stainless steel substrate by radio frequency reactive magnetron sputtering in 100% N2 plasma. X-ray diffraction results revealed that Nb is soluble in TiN up to x = 0.77. From x = 0.26 to x = 0.77, these films stabilized in rock salt structure with (111) orientation. The hardness and Young’s modulus increased, whereas electrical resistivity decreased with an increase in the Nb concentration in the films. The highest value of hardness and Young’s modulus were 31 and 320 GPa, respectively, for x = 0.77, at which the value of the lowest resistivity of 56 μΩ-cm was measured. The films showed a broad reflectance band, with a minimum in reflectance that shifted to shorter wavelengths as a function of increasing x. The reflectance band extended from the ultraviolet (~250 nm) to the visible region (~750 nm) and the position of the reflectance shifted from 2.33 to 3 eV with an increase in x from 0 to 0.77.

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Acknowledgements

The authors acknowledged the support received from the UPE, DST-FIST and UGC-CAS programs. KV thanked the DST-CFN project for financial support in the form of a fellowship. Infrastructural support provided by DST under the Centre for Nanotechnology, University of Hyderabad is acknowledged. The help of Prof. G. Rajaram and Mr. Ch. Ravi Kumar of the School of Physics, University of Hyderabad in the four probe measurements is gratefully acknowledged.

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Authors and Affiliations

  1. School of Physics, University of Hyderabad, Hyderabad, 500 046, India

    K. Vasu & M. Ghanashyam Krishna

  2. Centre for Nanotechnology, University of Hyderabad, Hyderabad, 500 046, India

    K. Vasu, M. Ghanashyam Krishna & K. A. Padmanabhan

  3. School of Engineering Sciences and Technology, University of Hyderabad, Hyderabad, 500 046, India

    K. A. Padmanabhan

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  1. K. Vasu
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  2. M. Ghanashyam Krishna
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  3. K. A. Padmanabhan
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Correspondence to M. Ghanashyam Krishna.

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Vasu, K., Krishna, M.G. & Padmanabhan, K.A. Effect of Nb concentration on the structure, mechanical, optical, and electrical properties of nano-crystalline Ti1−x Nb x N thin films. J Mater Sci 47, 3522–3528 (2012). https://doi.org/10.1007/s10853-011-6197-x

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  • DOI: https://doi.org/10.1007/s10853-011-6197-x

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