Abstract
Pure nickel thin films were deposited on Si (100) substrates under different conditions of sputtering using direct current magnetron sputtering from a nickel metal target. The different deposition parameters employed for this study are target power, argon gas pressure, substrate temperature and substrate-bias voltage. The films exhibited high density of void boundaries with reduction in <111> texture deposited under high argon gas pressures. At argon gas pressure of 5 mTorr and target power of 300 W, Ni deposition rate was ~40 nm/min. In addition, coalescence of grains accompanied with increase in the film texture was observed at high DC power. Ni films undergo morphological transition from continuous, dense void boundaries to microstructure free from voids as the substrate-bias voltage was increased from −10 to −90 V. Furthermore, as the substrate temperature was increased, the films revealed strong <111> fiber texture accompanied with near-equiaxed grain structure. Ni films deposited at 770 K showed the layer-by-layer film formation which lead to dense, continuous microstructure with increase in the grain size.
Similar content being viewed by others
References
Kawabata K, Tanaka T, Kitabatake A, Yamada K, Mikami Y, Kajioka H, Toiyama K (2001) J Vac Sci Technol A 19:1438
Gambino JP, Colgan EG (1998) Mater Chem Phys 52:99
Tam PL, Nyborg L (2009) Surf Coat Technol 203:2886
Avendano A, Azens A, Niklasson GA, Granqvist CG (2007) Mater Sci Eng B 138:112
Ai L, Fang G, Yuan L, Liu N, Wang M, Li C, Zhang Q, Li J, Zhao X (2008) Appl Surf Sci 254:2401
Zhang H, Zhou YN, Sun Q, Fu ZW (2008) Solid State Sci 10:1166
Nakai H, Qiu H, Adamik M, Safran G, Barna PB, Hashimoto M (1995) Thin Solid Films 263:159
Yang J, Makihara K, Nakai H, Hashimoto M, Barna A, Barna PB (1998) Thin Solid Films 319:115
Yang Y, Qiu H, Chen X, Yu M (2009) Appl Surf Sci 255:6226
Pauleau Y, Kukielka S, Gulbinski W, Ortega L, Dub SN (2006) J Phys D Appl Phys 39:2803
Yin Y, Pan Y, Rubanov S, Bilek MMM, McKenzie DR (2009) Nanosci Nanotechnol Lett 1:32
Tu KN, Mayer JW (1978) In: Poate JM, Tu KN, Mayer JW (eds) Thin films inter-diffusion and reactions. John Wiley, New York
Chiu KCR, Poate JM, Feldman LC, Doherty CJ (1980) Appl Phys Lett 36:544
Jardim PM, Acchar W, Losch W (1999) Appl Surf Sci 137:163
Bhaskaran M, Sriram S, Mitchell DRG, Short KT, Holland AS, Mitchell A (2009) Micron 40:11
Oukassi S, Moulet JS, Lay S, Hodaj F (2009) Microelectron Eng 86:397
Bendahan Marc, Canet Pierre, Seguin Jean-Luc, Carchano Herve (1995) Mater Sci Eng B 34:112
Chen JZ, Wu SK (1999) Thin Solid Films 339:194
Chen P, Ting JM (2001) Thin Solid Films 398–399:597
Ishida A, Sato M (2003) Acta Mater 51:5571
Ho KK, Carman GP (2000) Thin Solid Films 370:18
Fu Y, Du H, Huang W, Zhang S, Hu M (2004) Sens Actuators A 112:395
Setton M, Van der Spiegel J, Rothman B (1989) J Mater Res 4:1218
Lehnert T, Tixier S, Boni P, Gotthardt R (1999) Mater Sci Eng A 273–275:713
Cho HHY, Kim HY, Miyazaki S (2006) Mater Sci Eng A 438–440:699
Krulevitch P, Ramsey PB, Makowiecki DM, Lee AP, Northrup MA, Johnson GC (1996) Thin Solid Films 274:101
Ohta A, Bhansali S, Kishimoto I, Umeda A (2000) Sens Actuators A 86:165
Sanjabi S, Cao YZ, Sadrnezhaad SK, Barber ZH (2005) J Vac Sci Technol A 23:1425
Inoue S, Sawada N, Namazu T (2009) Vacuum 83:664
Fu YQ, Luo JK, Flewitt AJ, Huang WM, Zhang S, Du HJ, Milne WI (2009) Int J Comput Mater Sci Surf Eng 2:208
Iseki T, Maeda H, Itoh T (2008) Vacuum 82:1162
Zhang H, Poole J, Eller R, Keefe M (1999) J Vac Sci Technol A 17:1904
Chang SA, Skolnik MB, Altman C (1986) J Vac Sci Technol A 4:413
Zendehnam A, Ghanati M, Mirzaei M (2007) J. Phys.: Conference Series 61:1322
Ohring M (1991) Materials science of thin films: deposition and structure. Academic press, San Diego
Assuncao V, Fortunato E, Marques A, Aguas H, Ferreira I, Costa MEV, Martins R (2003) Thin Solid Films 427:402
Gou L, Ran CQJ, Zheng C (1999) Thin Solid Films 345:42
Mikami Y, Yamada K, Ohnari A, Degawa T, Migita T, Tanaka T, Kawabata K, Kajioka H (2000) Surf Coat Technol 133–134:295
Kuwahara K, Fujiyama H (1994) IEEE Trans Plasma Sci 22(4):442
Chan KY, Teo BS (2005) J Mater Sci 40:5971. doi:10.1007/s10853-005-1362-8
Paul A, Wingberműhle J (2006) J Appl Surf Sci 252:8151
Wu ML, Kiely JD, Klemmer T, Hsia YT, Howard K (2004) Thin Solid Films 449:120
Musil J, Matous J, Vlcek J, Koydl L, Muller K (1994) Czech J Phys 44:565
Igasaki Y, Kanma H (2001) Appl Surf Sci 169–170:508
Cheng H, Sun Y, Hing P (2003) Thin Solid Films 434:112
Chawla V, Jayaganthan R, Chawla AK, Chandra R (2008) Mater Chem Phys 111:414
Mitra R, Hoffman RA, Madan A, Weertman JR (2001) J Mater Res 16:1010
Shinmitsu T, Shi J, Hashimoto M (2002) Surf Coat Technol 151:55
Almtoft KP, Bottiger J, Chevallier J, Schell N, Martins RMS (2005) J Mater Res 20:1071
Chan KY, Teo BS (2007) Microelectron J 38:60
Thornton JA (1986) J Vac Sci Technol A 4:3059
Thornton JA (1974) J Vac Sci Technol 11:666
Thornton JA (1975) J Vac Sci Technol 12:830
Qiu H, Nakai H, Hashimoto M, Safran G, Adamik M, Barna P, Yagi E (1994) J Vac Sci Technol A 12:2855
Ishino M, Yang J, Makihara K, Shi J, Hashimoto M (2000) J Vac Sci Technol A 18:2339
Shi J, Kojima D, Hashimoto M (2000) J Appl Phys 88:1679
Acknowledgements
This research was supported by Indian Institute of Technology, Kharagpur, India. The authors would like to thank Prof. R. Mitra of Indian Institute of Technology, Kharagpur for his helpful comments and suggestions.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Geetha Priyadarshini, B., Aich, S. & Chakraborty, M. Structural and morphological investigations on DC-magnetron-sputtered nickel films deposited on Si (100). J Mater Sci 46, 2860–2873 (2011). https://doi.org/10.1007/s10853-010-5160-6
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10853-010-5160-6