Journal of Materials Science

, Volume 44, Issue 17, pp 4625–4632 | Cite as

Carbon based conductive photoresist

  • Nina Hauptman
  • Maša Žveglič
  • Marijan Maček
  • Marta Klanjšek GundeEmail author


A conductive photoresist for photolithographic application was studied here. The negative near-UV sensitive epoxy-based photoresist was used as a polymer matrix and conductive carbon black was used as functional filler. DC electrical resistivity of composite as a function of filler concentration has a well-known S-shape. After UV-exposure the resistivity of the composite decreases for almost five orders of magnitude, mostly at percolation threshold (approx. 0.6 vol.%). This effect can be attributed to the fully cross-linked polymer structure formed during UV-exposure of the composite. The resistivity of prepared samples also depend on the state of dispersion of the functional filler obtained using different dispersing additives. Composites with better dispersed particles have lower resistivities. This effect remained below one order of magnitude and decreased after UV-exposure. The composites with carbon black concentration of up to 1.1 vol.% are suitable for spin-coating and photolithography.


Percolation Threshold Conductive Filler Filler Concentration Glycidyl Ether Conductive Polymer Composite 



This research was supported by Slovenian research Agency (Project No. J2-9455). Nina Hauptman and Maša Žveglič acknowledge the Slovenian Research Agency for young researchers support. Free carbon black samples from Evonik-Degussa Croatia are gratefully acknowledged. AIM Chemicals Croatia is acknowledged for providing free dispersants.


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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Nina Hauptman
    • 1
  • Maša Žveglič
    • 1
  • Marijan Maček
    • 2
  • Marta Klanjšek Gunde
    • 1
    Email author
  1. 1.National Institute of ChemistryLjubljanaSlovenia
  2. 2.Faculty of Electrical EngineeringUniversity of LjubljanaLjubljanaSlovenia

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