Journal of Materials Science

, Volume 44, Issue 17, pp 4599–4603 | Cite as

Thermal stability and magnetic anisotropy of nickel nanoplates

  • Yonghua Leng
  • Jie Zheng
  • Jianglan Qu
  • Xingguo LiEmail author


The thermal stability and magnetic anisotropies of nickel nanoplates with {111} planes as the exposure plane are studied. The melting point of Ni nanoplates drastically drops as compared to that of the bulk one due to the significant increase in the surface free energy. For the large aspect ratio, these nanoplates tend to lie flat on silicon wafer and form a thin Ni {111} plane film. Both the coercivity and the remnant magnetization of the Ni film deeply depend on the applied field direction. As the angle between the film plane and the applied field direction varies from zero to 45° and to 90°, the coercivity measured at 5 K increases from 335 Oe to 373 and to 410 Oe. Correspondingly, the remnant magnetization decreases from 18.1 to 15.8 to be 10.4 emu/g.


Silicon Wafer Select Area Electron Diffraction Oxygen Reduction Reaction Magnetic Anisotropy FePt 



The authors acknowledge NSFC (Nos. 20671004 and 20821091), MOST of China (No. 2009CB939902), MOE of China (No. 707002) and Delta Electronics INC.


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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Yonghua Leng
    • 1
  • Jie Zheng
    • 1
  • Jianglan Qu
    • 1
  • Xingguo Li
    • 1
    • 2
    Email author
  1. 1.Beijing National Laboratory for Molecular Sciences (BNLMS), The State Key Laboratory of Rare Earth Materials Chemistry and Applications, College of Chemistry and Molecular EngineeringPeking UniversityBeijingChina
  2. 2.College of EngineeringPeking UniversityBeijingChina

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