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Journal of Materials Science

, Volume 44, Issue 11, pp 2931–2937 | Cite as

Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques

  • Taíse Matte ManhaboscoEmail author
  • Iduvirges L. Müller
Article

Abstract

In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.

Keywords

Magnetic Behavior Magnetic Hysteresis Loop Perpendicular Magnetic Anisotropy Semiconductor Substrate Magnetic Field Parallel 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Taíse Matte Manhabosco
    • 1
    Email author
  • Iduvirges L. Müller
    • 1
  1. 1.Laboratory of Corrosion Research, Metallurgy DepartmentUniversidade Federal do Rio Grande do SulPorto AlegreBrazil

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