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Microstructure and magnetic properties of electrodeposited cobalt films

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Abstract

Cobalt films were electrodeposited onto both iron and copper substrates from an aqueous solution containing a mixture of cobalt sulfate, boric acid, sodium citrate, and vanadyl sulfate. The structural, intermetallic diffusion and magnetic properties of the electrodeposited films were studied. Cobalt electrodeposition was carried out in a passively divided cell aided by addition of vanadyl sulfate to keep the counter electrode clean. The divided electrolytic cell with very negative current densities cause the electrodeposited Co to adopt a face-centered cubic (fcc) structure, which is more magnetically reversible than the hexagonally close-packed (hcp) structured Co. The coercive field is also significantly less in the fcc-electrodeposited cobalt than in the hcp. SEM images show dense, uniform Co films without any cracks or porosity. Beside the deposition current, thickness of the film was also found to affect the crystal orientation particularly on iron substrates. Diffusion of cobalt film into the iron substrate was studied under reduced environment and a fast process was observed.

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References

  1. Barrera E, Palomar Pardavé M, Batina N, González I (2000) J Electrochem Soc 147(5):1787

    Article  CAS  Google Scholar 

  2. Pfeifer F, Raddeloff C (1980) J Magn Magn Mater 19:190

    Article  CAS  Google Scholar 

  3. Yu RH, Basu S, Zhang Y, Xiao JQ (1999) J Appl Phys 85:6034

    Article  CAS  Google Scholar 

  4. Li L (1996) J Appl Phys 79:4578

    Article  CAS  Google Scholar 

  5. Major RV, Samadian V (1989) J Mater Eng 11(1):27

    Article  CAS  Google Scholar 

  6. Yu RH, Basu S, Zhang Y, Parvizi-Majidi A, Xiao JQ (1999) J Appl Phys 85:6655

    Article  CAS  Google Scholar 

  7. Kakuno EM, Mosca DH, Mazzaro I, Mattoso N, Schreiner WH, Gomes MAB (1997) J Electrochem Soc 144(9):3222

    Article  CAS  Google Scholar 

  8. Fontana RE (1995) IEEE Trans Magn MAG-31:2579

    Article  Google Scholar 

  9. Grochowski E, Scranton RA, Croll I (1994) In: Romankiw LT, Herman DA Jr (eds) Magnetic materials, processes, and devices III, vol PV 94-6. The Electrochemical Society Proceedings Series, Pennington, NJ, p 3

  10. Liao SH (1990) IEEE Trans Magn MAG-26:328

    Article  Google Scholar 

  11. Croll IM (1980) Advances in X-ray analysis, vol 4. Plenum Press, New York, p 151

  12. Croll IM, May BA (1987) In: Romanikiw LT, Turner DR (eds) Electrodeposition technology, theory and practice, vol PV 87-17. The Electrochemical Society Proceeding Series, Pennington, NJ, p 295

  13. Brossared L (1991) Mater Chem Phys 27:235

    Article  Google Scholar 

  14. Cui CQ, Jiang SP, Tseung ACC (1991) J Electrochem Soc 138:1001

    Article  CAS  Google Scholar 

  15. Nishizawa T, Ishida K (1986) Met Prog 129(2):57

    Google Scholar 

  16. Yu RH, Basu S, Ren L, Zhang Y, Parvizi-Majidi A, Unruh KM, Xiao JQ (2000) IEEE Trans Magn 36(5):3388

    Article  CAS  Google Scholar 

  17. Bozorth RM (1991) Ferromagnetism. IEEE, New York

    Google Scholar 

  18. Ashby JA, Flower HM, Rawling RD (1977) Met Sci 11:91

    Article  CAS  Google Scholar 

  19. Pitt CD, Rawling RD (1981) Met Sci 15:369

    Article  CAS  Google Scholar 

  20. Yu RH, Zhu J (2005) J Appl Phys 97:53905

    Article  Google Scholar 

Download references

Acknowledgements

The authors would like to thank Rad Radhakrishnan for helpful discussions and Lee Heatherly for Auger analysis. Also, thanks go to ORISE and HTML Share facilities. This work was sponsored by the Department of Energy, Office of Basic Energy Sciences—Division of Materials Sciences and Engineering, Office of Electricity Delivery and Energy Reliability (OE). This research was performed at the Oak Ridge National Laboratory, managed by UT-Battelle, LLC for the USDOE under contract DE-AC05-00OR22725U.S.

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Authors and Affiliations

  1. Materials Chemistry Group, Chemical Science Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA

    M. S. Bhuiyan, B. J. Taylor & M. Paranthaman

  2. Tennessee Technological University, Cookeville, TN, 38505, USA

    B. J. Taylor

  3. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA

    J. R. Thompson

  4. Department of Physics, University of Tennessee, Knoxville, TN, 37996-1200, USA

    J. R. Thompson & J. W. Sinclair

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  1. M. S. Bhuiyan
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  2. B. J. Taylor
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  3. M. Paranthaman
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  4. J. R. Thompson
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  5. J. W. Sinclair
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Correspondence to M. Paranthaman.

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Bhuiyan, M.S., Taylor, B.J., Paranthaman, M. et al. Microstructure and magnetic properties of electrodeposited cobalt films. J Mater Sci 43, 1644–1649 (2008). https://doi.org/10.1007/s10853-007-2383-2

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  • DOI: https://doi.org/10.1007/s10853-007-2383-2

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