Growth of single phase tetragonal structure iron tantalum oxide thin films grown by sol–gel spin coating technique

The above article was submitted and published in JMSL 20 (2001) 969 with an unintentional mistake: Fig. 5 is incorrect. The correct figure is reproduced below with a modified caption. The author apologises for any inconvenience or embarrassment caused.

Fig. 5

Atomic Force microscopy images of Fe₂Ta₂O₈ thin films deposited on Si (100) annealed at (a) 600°C/5 h, (b) 700°C/5 h and (c) 800°C/5 h