Nanostructured thin films on a silicon substrate were obtained by high-frequency periodic pulse f ~ 6–10 kHz action of laser radiation with wavelength λ = 1.064 μm and power density q = 120 MW/cm2 on zirconium in a vacuum chamber at pressure p = 2.2 Pa. The morphology of the thin films of zirconium was studied by atomic-force microscopy. The transmission spectra of the zirconium films in the visible and near and mid IR regions were obtained. The electrophysical characteristics of the Zr/Si structures were analyzed.
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Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 90, No. 6, pp. 877–881, November–December, 2023.
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Bosak, N.A., Chumakov, A.N., Baran, L.V. et al. Microstructure and Properties of Thin Films of Zirconium Produced by High-Frequency Laser Deposition. J Appl Spectrosc 90, 1236–1240 (2024). https://doi.org/10.1007/s10812-024-01659-2
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DOI: https://doi.org/10.1007/s10812-024-01659-2