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Silicon Plasma Heating in Air under Combined Bichromatic Laser Radiation at Wavelengths of 355 and 532 nm

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Journal of Applied Spectroscopy Aims and scope

The formation and heating of laser plasma when silicon is irradiated in ambient air by pulsed laser radiation with wavelengths of 355 and 532 nm at radiation power density up to 5 GW/cm2 has been experimentally investigated. An increased efficiency of the formation and heating of ablation plasma is observed when nanosecond pulses with a wavelength of 355 nm are leading in the bichromatic irradiation of silicon.

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Authors and Affiliations

  1. B. I. Stepanov Institute Physics of the National Academy of Sciences of Belarus, Minsk, Belarus

    A. N. Chumakov & V. V. Lychkoskyi

Authors
  1. A. N. Chumakov
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  2. V. V. Lychkoskyi
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Correspondence to A. N. Chumakov.

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Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 88, No. 6, pp. 900–906, November–December, 2021.

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Chumakov, A.N., Lychkoskyi, V.V. Silicon Plasma Heating in Air under Combined Bichromatic Laser Radiation at Wavelengths of 355 and 532 nm. J Appl Spectrosc 88, 1169–1175 (2022). https://doi.org/10.1007/s10812-022-01295-8

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  • DOI: https://doi.org/10.1007/s10812-022-01295-8

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