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Method of resonance near-field optical microscopy

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Journal of Applied Spectroscopy Aims and scope

Abstract

We have solved the problem in which a thin metal wafer (probe) with a nanohole interacts with the flat surface of a metastructured film consisting of metal nanoparticles in an external optical radiation field. Nanoparticles are considered as two-level atomic systems. This interaction of the wafer-probe and the flat surface in the external optical radiation field gives rise to optical near-field resonance, the frequency of which differs significantly from the natural frequencies of two-level atoms in the medium and the probe. The fields inside and outside the probe and metastructured film are calculated in the near-field and far-field zones. The maximum resolution, which is achievable in the suggested scheme of near-field optical microscopy, can reach about 10 nm.

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Authors and Affiliations

  1. Ulyanovsk State University, 42 L. Tolstoi St., Ulyanovsk, 432970, Russia

    A. S. Kadochkin

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  1. A. S. Kadochkin
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Correspondence to A. S. Kadochkin.

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Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 74, No. 4, pp. 499–506, July–August, 2007.

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Kadochkin, A.S. Method of resonance near-field optical microscopy. J Appl Spectrosc 74, 552–560 (2007). https://doi.org/10.1007/s10812-007-0087-7

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  • DOI: https://doi.org/10.1007/s10812-007-0087-7

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