Abstract
The boron-doped three-dimensional (3D) cubic ordered mesoporous carbon (B-OMC) is prepared by the decomposition of acetylene and triisopropyl borate on Fe-KIT-6 at 700 °C via in house developed simple bubbler-assisted chemical vapour deposition setup. The small-angle XRD and HRTEM analysis confirmed that the resultant material possesses a 3D cubic structure with an Ia3d space group and highly ordered mesopores that are arranged in regular intervals, respectively. The N2 adsorption/desorption isotherm revealed a surface area of about 301.07 m2/g and average pore size of around 4.57 nm. X-ray photoelectron spectroscopy (XPS) confirms that the boron atoms on the carbon nanostructure can be doped successfully. The electrochemical performance of the B-OMC shows a high specific capacitance of 329 F/g at a scan rate of 1 mV/s and 297 F/g at a current density of 0.2 A/g, excellent cycling stability of 97%, and low resistance in 6 M KOH. The fabricated symmetric supercapacitor device (B-OMC//B-OMC) with 1 M Na2SO4 reveals a relatively high energy density (10.27 Wh/kg) and power density (300.59 W/kg). Furthermore, the symmetric supercapacitor exhibited good cyclic stability with specific capacitance retention of 88.4% after 10,000 consecutive cycles, even with a high potential window of 2.0 V.
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Acknowledgements
This research work was partly supported by the DST-Nanomission (SR//NM/NS-02/2011 (C)), India. The instrument facilities were provided by DST-FIST-sponsored Department of Chemistry & Institute of Catalysis and Petroleum Technology (ICPT), Anna University, Tamil Nadu, India.
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KGG, and PA wrote main contribution of the manuscript. RV has contributed synthesis of catalytic template (Fe-KIT-6), B-OMCs and purification part RKR has done characterization of XPS. GR has wrote low-angle XRD and wide-angle XRD. All authors reviewed the manuscript.
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Govindarasu, K.G., Venkatesan, R., Rajagopal, R.K. et al. Enhanced electrochemical performances of three-dimensional cubic ordered mesoporous carbon by boron-doping for supercapacitor applications. J Appl Electrochem 53, 1111–1124 (2023). https://doi.org/10.1007/s10800-022-01833-4
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DOI: https://doi.org/10.1007/s10800-022-01833-4