Journal of Applied Electrochemistry

, Volume 40, Issue 4, pp 849–854 | Cite as

Behavior of hydrogen nanobubbles in alkaline electrolyzed water and its rinse effect for sulfate ion remained on nickel-plated surface

  • Toshikazu TakenouchiEmail author
Original Paper


More than ordinary rinsing using pure water, cathode water obtained by electrolysis of dilute potassium carbonate aqueous solution (alkaline electrolyzed water: AEW) exhibits a stronger rinse effect for elimination of remaining sulfate ions when rinsing nickel-plated surfaces. This rinse effect was recognized even for AEW that was used 24 h after it was produced, but not 1 week after. Behaviors of hydrogen nanobubbles observed by dynamic light scattering revealed nanobubbles of about 128-nm diameter even 24 h after generation. The Ostwald ripening phenomenon was observed. Hydrogen nanobubbles in an open system changed: some shrank because of ripening, later dissolving in the aqueous solution and disappearing; others showed swelling and expansion. One week later, few nanobubbles smaller than 300 nm were observed. Rinse effects by AEW, which are attributable to the actions of hydrogen nanobubbles generated in AEW, occur because sulfate ions are cleaned and removed from the nickel-plated surface.


Alkaline electrolyzed water Hydrogen nanobubbles Rinse Sulfate ion 



The authors wish to thank Mr. Mitsuaki Hashimoto and Mr. Kazushi Sasa of Otsuka Electronics Co. Ltd. for their assistance with measurement of the particle size and size distribution of hydrogen nanobubbles. We also wish to thank Dr. Shinichi Wakabayashi of the Nagano Techno Foundation for his valuable advice related to the specific adsorption of sulfate ions.


  1. 1.
    Furuguchi T, Morishita A (2002) Japan Patent Application No. 2002-155006Google Scholar
  2. 2.
    Takennouchi T, Tanaka H, Wakabayashi S (2003) J Surf Finish Soc Jpn 54:818CrossRefGoogle Scholar
  3. 3.
    Imaoka T, Yamanaka K (2000) J Surf Finish Soc Jpn 51:141Google Scholar
  4. 4.
    Morita H, Ida J, Ota O, Tsukamoto K, Ohmi T (2001) Solid State Phenom 76–77:245–250CrossRefGoogle Scholar
  5. 5.
    Takenouchi T, Wakabayashi S (2006) J Appl Electrochem 36:1127CrossRefGoogle Scholar
  6. 6.
    Takenouchi T, Sato U, Nishio Y (2009) Electrochemistry 77:521Google Scholar
  7. 7.
    Takahashi M (2005) J Phys Chem B109:21858Google Scholar
  8. 8.
    Kikuchi K, Takeda H, Rabolt B, Okaya T, Ogumi Z, Saihara Y, Noguchi H (2001) J Electroanal Chem 506:22CrossRefGoogle Scholar
  9. 9.
    Kikuchi K, Tanana Y, Saihara Y, Maeda M, Kawamura M, Ogumi Z (2006) Colloid Interface Sci 298:914CrossRefGoogle Scholar
  10. 10.
    Kikuchi K (2004) The characteristics and advanced technology of water. NTS, Tokyo, p 24Google Scholar
  11. 11.
    Morinaga H (2001) Jpn Soc Appl Phys 70:1067Google Scholar
  12. 12.
    Ohki K, Yagi K (1993) Basic knowledge of cleaning. Sangyo-Tosyo, Tokyo, p 28Google Scholar
  13. 13.
    Pourbaix M (1974) Atlas of electrochemical equilibria in aqueous solutions. National Association of Corrosion Engineers, HoustonGoogle Scholar
  14. 14.
    Yamasaki S, Aoki H, Nishiyama I, Aoto H (1997) Proc. of Jpn Soc Appl Physics annual meeting 1997 spring, Tokyo, p 775Google Scholar
  15. 15.
    Yamanaka K, Futatsuki T, Aoki H, Nakamori M, Aoto N (1996) Proc. of 5th international symposium on semiconductor manufacturing, Tokyo, p 200Google Scholar
  16. 16.
    Nakamura M, Endo O, Ohta T, Ito M, Yoda Y (2002) Surf Sci 514:227CrossRefGoogle Scholar
  17. 17.
    Seo M (2007) J Surf Finish Soc Jpn 58:655Google Scholar
  18. 18.
    Wan LJ, Hara M, Inukai J, Itaya K (1999) J Phys Chem B 103:6978CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media B.V. 2010

Authors and Affiliations

  1. 1.Research and Development DivisionShinko Electric Industries Co., LtdNagano-shiJapan

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