Abstract
For the purpose of thermal engineering applications, thermal radiation phenomena of surfaces of chromium and palladium in a high-temperature air-oxidation process on the basis of simultaneous measurements of spectra of normal incidence hemispherical reflectance and normal emittance in the near-ultraviolet through infrared region are investigated. As the results of the spectral measurements, clear radiation interference is observed even in the spectra of the hemispherical reflectance of a rough-finished chromium surface in the oxidation process as well as in the spectra of the normal reflectance of a specular-finished surface. The relation between the chemical reactions of oxidation and reduction of a palladium surface in the 1000 K to 1100 K range and the radiation characteristics are analyzed based on the temperature hysteresis of radiation spectra and the reaction rates of oxidation and reduction. A switching function of radiation characteristics of palladium accompanied by the oxidation and reduction reactions is suggested to be applicable for engineering applications.
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Abbreviations
- A N :
-
Normal incidence absorptance (= 1 − R NH)
- d :
-
Average thickness of film, m
- n :
-
Index of refraction
- R NH :
-
Normal incidence hemispherical reflectance
- R NN :
-
Normal incidence specular reflectance (specular reflection component of hemispherical reflectance R NH)
- t :
-
Time after the start of heating, s
- T :
-
Surface temperature, K
- ε N :
-
Normal emittance
- λ:
-
Wavelength of radiation in vacuum, m
- λ(1) :
-
Wavelength of the valley of oscillation of the first-order interference in R NH spectrum, m
- λ(2) :
-
Wavelength of the valley of oscillation of the second-order interference in R NH spectrum, m
- σ :
-
Root-mean-square roughness, m
- H:
-
Hemispherical reflection
- N:
-
Normal (15° direction in measurement) incidence, reflection, and emission
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Wakabayashi, H., Makino, T. Thermal Radiation Phenomena of Surfaces of Chromium and Palladium in a High-Temperature Environment. Int J Thermophys 32, 2112–2126 (2011). https://doi.org/10.1007/s10765-011-1104-x
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DOI: https://doi.org/10.1007/s10765-011-1104-x