CuO thin deposits on a tungsten carbide (consisting of 9% cobalt) substrate are obtained by physical vapor deposition (PVD) at ambient temperature. The longitudinal thermal conductivity as well as the thermal contact resistance at the deposit–substrate interface are investigated. A periodic photothermal experiment based on infrared radiometry is implemented. The amplitude between the periodic heat flux applied on the sample and the average temperature on the heated area are measured over a low frequency range. The method does not require the absolute measurement of these two quantities given that the thermal properties of the substrate are known. Scanning electron microscopy observations show strong anisotropy and columnar structure of the deposits. Moreover, the chemical composition of the films is obtained using the Auger technique. Cobalt diffuses from the substrate toward the deposit during the deposition process. It is demonstrated that the measured thermal conductivity of the CuO layer mainly rests on the microstructure of the layer instead of the roughness of the sample.
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References
Cahill D.G, Bullen A., Lee S.-M. (2000). High Temp.-High Press. 32:134
Orain S., Scudeller Y., Brousse T. (2000). Int. J. Therm. Sci. 39:537
Dilhaire S., Grauby S., Claeys W., Batsale J.-C. (2004). Microelectr. J. 35:811
Faugeroux O., Claudet B., Bénet S., Serra J.J, Boisson D. (2003). Int. J. Therm. Sci. 43:383
Battaglia J.-L., Kusiak A., Bamford M., Batsale J.-C. (2006). Int. J. Therm. Sci. 45:1035
Bhusari D.M, Teng C.W, Chen K.H, Wie S.L, Chen L.C (1997). Rev. Sci. Instrum. 68:4180
Langer G., Hartmann J., Reichling M. (1997). Rev. Sci. Instrum. 68:1510
Chen G. (2000). J. Nanoparticle Res. 2:199
Ju Y.S, Goodson K.E. (1999). Appl. Phys. Lett. 74:3005
Sheppard K.G, Nakahara S. (1991). Process. Adv. Mat. 1:27
Wieder H., Czanderna A.W. (1966). J. Appl. Phys. 37:184
D. R. Lide, ed., CRC Handbook of Chemistry and Physics, 87th Ed. (CRC Press, Boca Raton, Florida, 2006).
Gustavsson M., Karawacki E., Gustafsson S.E. (1994). Rev. Sci. Instrum. 65:3856
Coleman T.F, Li Y. (1996). SIAM J. Optimiz. 6:418
Coleman T.F, Li Y. (1994). Math. Program. 67:189
Walther H.G. (2002). Appl. Surface Sci. 193:156
Nicolaides L., Mandelis A. (2001). J. Appl. Phys. 90:1255
A. L. Edwards, A Compilation of Thermal Property Data for Computer Heat-Conduction Calculations, UCRL-50589 (University of California, Lawrence Radiation Laboratory, 1969).
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Paper presented at the Seventeenth European Conference on Thermophysical Properties, September 5-8, 2005, Bratislava, Slovak Republik.
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Battaglia, JL., Kusiak, A. Thermophysical Characterization of a CuO Thin Deposit. Int J Thermophys 28, 1563–1577 (2007). https://doi.org/10.1007/s10765-007-0175-1
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DOI: https://doi.org/10.1007/s10765-007-0175-1