This is devoted to the development of technology for forming the required microrelief of the optical surfaces of glass-ceramic substrates. It is shown that the problem can be solved by using controlled local deposition of silicon dioxide coatings on the surface by laser pyrolysis of tetraethoxysilane vapor in the presence of ozone. The characteristics of the experimental samples are presented and are compared with data obtained from mathematical modeling of the results of technological processes. It is shown that the developed technology can be used to profile substrates with large radii of curvature by successive deposition of multifilm coatings of interference spherical mirrors.
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References
V. I. Kashirin, Principles of Figuring Optical Surfaces: A Course of Lectures [in Russian], GOU VPO UGTU – UPI, Ekaterinburg (2006).
M. Zeuner and S. Kiontke, “Ion beam figuring technology in optics manufacturing: An established alternative for commercial applications,” Optik&Photonik, 7(2), 56 – 58 (2012).
M. Ghigo, R. Canestrari, D. Spiga, and A. Novi, “Correction of high spatial frequency errors on optical surfaces by means of Ion Beam Figuring,” Proc. of SPIE, 6671, 667114 – 6 (2007).
M. Castelli, R. Jourdain, P. Morantz, and P. Shore, “Reactive atom plasma for rapid figure correction of optical surfaces,” Key Eng. Mater., 496, 182 – 187 (2012).
H. L. Jin, B. Wang, and F. H. Zhang, “Effect on surface roughness of zerodur material in atmospheric pressure plasma jet processing,” Proc. SPIE, 7655, 76552X1-7 (2010).
J. R. Kurdock and R. R. Austin, “Correction of optical elements by the addition of evaporated films,” Phys. Thin Films, No. 10, 261 – 308 (1978).
Ch.-Ch. Lee and D.-Sh. Wan, “Making aspherical mirrors by thin-film deposition,” Appl. Opt., 32(28), 5535 – 5540 (1993).
V. V. Potelov and B. N. Senik, “Aspherization high-precision optical elements by vacuum deposition,” Opt. Zh., 71(12), 14 – 19 (2004).
E. R. Aleev, V. M. Garmash, L. V. Kas’yanova, et al., “Deposition of antireflection coatings by laser pyrolysis,” Opt. Zh., No. 2, 55 – 57 (1993).
A. V. Samuylov, V. V. Rumyantsev, V. I. Molev, and S. I. Annushkin, “Physical and chemical properties of optical sitall SO 115M (Astrositall®),” Kontenant, No. 4, 24 – 31 (2002).
S. B. Desu, “Decomposition chemistry of tetraethoxysilane,” J. Am. Ceram. Soc., 72(9), 1615 – 1621 (1989).
H. Juárez, M. Pacio, T. Díaz, et al., “Low temperature deposition: properties of SiO2 films from TEOS and ozone by APCVD system,” J. Phys.: Conf. Ser., 167(1), 012020, pp. 1 – 6 (2009).
H. Juárez, T. Díaz, M. Pacio, et al., “Optical and electrical characterization of SiO2 films obtained by atmospheric pressure chemical vapor deposition,” Phys. Status Solidi C, No. 4, 1481 – 1484 (2007).
J. Kim, S. Jung, K. Jang, et al., “SiO2 Films deposited by APCVD with a TEOS/ozone mixture and its application to the gate dielectric of TFTs,” J. Electrochem. Soc., 157(2), H182 – H185 (2010).
B. Rathbone and P. I. Raspberry, Stepper Motor: Constructors Manual, Rotterdam (2013), pp. 1 – 16.
J. E. Greivenkamp and J. H. Bruning, Phase-shifting Interferometry in Optical Shop Testing, Wiley, New York (1992).
E. J. Kim and W. N. Gill, “Analytical model for chemical vapor deposition of SiO2 films using tetraethoxysilane and ozone,” J. Cryst. Growth, 140, 315 – 326 (1994).
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Translated from Steklo i Keramika, No. 11, pp. 11 – 17, November, 2016.
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Dorofeeva, E.V., Lobanov, P.Y., Manuilovich, I.S. et al. Surface Relief Forming on Optical Ceramic Articles by Laser Pyrolysis of Organosilicon Materials. Glass Ceram 73, 400–405 (2017). https://doi.org/10.1007/s10717-017-9898-z
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DOI: https://doi.org/10.1007/s10717-017-9898-z