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Modelling of radio frequency sheaths for plasma processing

  • Invited Papers and Discussion Summaries
  • Modelling Industrial Plasmas
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Czechoslovak Journal of Physics Aims and scope

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References

  1. D.B. Graves: IEEE Trans. Plasma Sci. 22 (1994) 31.

    Article  ADS  Google Scholar 

  2. M.A. Lieberman and A.J. Lichtenberg: Principles of plasma discharges and materials processing (Wiley, New York, 1994).

    Google Scholar 

  3. F. Schneider: Z. Angew. Phys. 6 (1954) 456.

    Google Scholar 

  4. H.S. Butler and G.S. Kino: Phys. Fluids 6 (1963) 1346.

    Article  ADS  Google Scholar 

  5. V.A. Godyak: Soviet Radio Frequency Discharge Research (Delphic Associates, Falls Church, VA, 1986).

    Google Scholar 

  6. M.M. Turner and V. Vahedi: Capacitive bias power coupling in high density inductive discharges, 1998, unpublished.

  7. M.A. Lieberman: IEEE Trans. Plasma Sci. 16 (1988) 638.

    Article  ADS  Google Scholar 

  8. D. Bohm: in The characteristics of electrical discharges in magnetic fields, edited by A. Guthrie and R. K. Wakerling (McGraw-Hill, New York, 1949), Chap. 3, pp. 77–86.

    Google Scholar 

  9. K.-U. Riemann: J. Phys. D: Appl. Phys. 24 (1991) 493.

    Article  ADS  Google Scholar 

  10. C.D. Child: Phys. Rev. 32 (1911) 493.

    ADS  Google Scholar 

  11. K.-U. Riemann: Phys. Fluids B 4 (1992) 2693.

    Article  ADS  Google Scholar 

  12. J.E. Allen and M.A. Skorik: J. Plasma Phys. 50 (1993) 243.

    Article  ADS  Google Scholar 

  13. M.A. Lieberman: IEEE Trans. Plasma Sci. 17 (1989) 338.

    Article  ADS  Google Scholar 

  14. V.A. Godyak and N. Sternberg: Phys. Rev. A 42 (1990) 2299.

    Article  ADS  Google Scholar 

  15. V.A. Godyak, R.B. Piejak and N. Sternberg: IEEE Trans. Plasma Sci. 21 (1993) 378.

    Article  ADS  Google Scholar 

  16. A. Metze, D.W. Ernie and H.J. Oskam: J. Appl. Phys. 60 (1986) 3081.

    Article  ADS  Google Scholar 

  17. P.A. Miller and M.E. Riley: J. Appl. Phys. 82 (1997) 3689.

    Article  ADS  Google Scholar 

  18. J. Liu, G.L. Huppert and H.H. Sawin: J. Appl. Phys. 68 (1990) 3916.

    Article  ADS  Google Scholar 

  19. C. Wild and P. Koidl: J. Appl. Phys. 69 (1991) 2909.

    Article  ADS  Google Scholar 

  20. H.R. Koenig and L.I. Maissel: IBM J. Res. Develop. 14 (1970) 168.

    Article  Google Scholar 

  21. M.V. Alves, M.A. Lieberman, V. Vahedi and C.K. Birdsall: J. Appl. Phys. 69 (1991) 3823.

    Article  ADS  Google Scholar 

  22. Y.P. Song, D. Field and D.F. Klemperer: J. Phys. D: Appl. Phys. 23 (1990) 673.

    Article  ADS  Google Scholar 

  23. M. Surendra and M. Dalvie: Phys. Rev. E 48 (1993) 3914.

    Article  ADS  Google Scholar 

  24. M.M. Turner: Phys. Rev. Lett. 75 (1995) 1312.

    Article  ADS  Google Scholar 

  25. M.M. Turner and M.B. Hopkins: Phys. Rev. Lett. 69 (1992) 3511.

    Article  ADS  Google Scholar 

  26. D. Vender and R.W. Boswell: J. Vac. Sci. Tech. B 10 (1992) 1331.

    Article  ADS  Google Scholar 

  27. S. Riyopoulos: Phys. Plasmas 3 (1996) 2511.

    Article  ADS  Google Scholar 

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Turner, M.M. Modelling of radio frequency sheaths for plasma processing. Czech J Phys 48 (Suppl 2), 59–69 (1998). https://doi.org/10.1007/s10582-998-0022-z

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