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Deposition of nanolayers by means of dense plasma focus

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Czechoslovak Journal of Physics Aims and scope

Abstract

In our preliminary experiments, reported in this paper, dense plasma focus (DPF) device is used for deposition of thin (a few nanometers of thickness) chromium layers. Such films have been deposited on silicon wafers by ablation of the chromium target using highly dense and highly temperature argon-oxygen plasma. Two films with different structure were obtained at the same substrate temperature using a fixed shot number (equal to 7). Surface topology and depth profiles of the films were studied by means of scanning electron microscopy (SEM) and secondary-ion mass spectrometry (SIMS), respectively.

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Authors and Affiliations

  1. Institute of Plasma Physics and Laser Microfusion, Hery 23, 01-497, Warsaw, Poland

    M. Chernyshova, I. Ivanova-Stanik, L. Karpiński, M. Scholz & B. Ulejczyk

  2. Institute of Physics Polish Academy of Sciences, Al. Lotników 32/46, 02-668, Warsaw, Poland

    I. N. Demchenko

  3. Korean Institute of Science and Technology, P.O. Box 131, Cheongryang, 130-650, Soul, Korea

    J. K. Lee

Authors
  1. M. Chernyshova
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  2. I. Ivanova-Stanik
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  3. L. Karpiński
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  4. M. Scholz
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  5. B. Ulejczyk
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  6. I. N. Demchenko
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  7. J. K. Lee
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Chernyshova, M., Ivanova-Stanik, I., Karpiński, L. et al. Deposition of nanolayers by means of dense plasma focus. Czech J Phys 56 (Suppl 2), B237–B242 (2006). https://doi.org/10.1007/s10582-006-0205-4

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  • DOI: https://doi.org/10.1007/s10582-006-0205-4

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