Abstract
Fabrication of high-aspect-ratio PDMS microfluidic devices with conventional SU-8 based soft photolithography is challenging, and often, the thickness of the master from which PDMS replicas are molded is non-uniform. Here, we present an optimized, low cost, fast prototyping microfabrication technique to make deep (up to 500 μm) and high-aspect-ratio (up to 10) microfluidic channels by producing masters by laminating a single or multiple layers of a thin dry film photoresist onto metal wafers. In particular, we explore the required exposure energy for different film thicknesses as well as the highest achievable channel depths and aspect ratios. The homogeneity of the depth of PDMS channels formed using these masters is quantified and found to be remarkably uniform over distances of 20 mm or more. The importance of the processing parameters, such as the exposure energy and development time on final feature size, wall angle, and channel aspect ratio, is investigated. In addition, we report some failure cases, the potential reasons, and strategies for making optimized devices. Potentially, deep microfluidic channels with a wide range of aspect ratios can be used to make long, homogenous separation devices that can be used in cell sorting, filtration, and flow cytometry. We believe the protocols we outline here will be of great utility to the microfluidics community.
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Acknowledgements
The authors would like to thank Prof. Dorian Liepmann (University of California Berkeley, SENSOR & ACTUATOR CENTER) for providing generous access to the profilometer in his lab. The first author appreciates financial support through the Postdoc fellowship from Fonds de recherche du Québec—Nature et Technologies (FQRNT). We are also grateful for partial financial support from The National Science Foundation (NSF, CBET-1066334).
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Khalkhal, F., Chaney, K.H. & Muller, S.J. Optimization and application of dry film photoresist for rapid fabrication of high-aspect-ratio microfluidic devices. Microfluid Nanofluid 20, 153 (2016). https://doi.org/10.1007/s10404-016-1817-z
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DOI: https://doi.org/10.1007/s10404-016-1817-z