Abstract
We propose a system for depositing thin films on waveguides which enables low-temperature deposition and precise control of the refractive index and film thickness. It is composed of a conventional ion-beam sputtering (IBS) system and a new system for directly monitoring film characteristics during deposition. We controlled refractive indices over a wide range from 1.52 to 1.97 by moving the sputtering targets (SiO2 and Si3N4) in the IBS system. The refractive index or film thickness was in-situ monitored by observing the optical power reflected from the end-face of a monitoring fiber set in the deposition chamber. Antireflection coating films were successfully deposited on a fiber end-face and a laser diode chip facet with low reflectivity from 0.05 to 0.07%. This deposition system is attractive for constructing highly functional optical devices for future photonic networks.
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Suzuki, Y., Nagaoka, S. & Uenishi, Y. Direct Monitoring of Thickness and Refractive Index of Optical Thin Film Deposited on Fiber End-face. OPT REV 6, 77–81 (1999). https://doi.org/10.1007/s10043-999-0077-5
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DOI: https://doi.org/10.1007/s10043-999-0077-5