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Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle

  • Special Section: The Fifth International Conference on: Optics-Photonics Design & Fabrication “ODF'06, Nara”: Regular Papers
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Abstract

The most serious problems for the matrix projection exposure using a liquid crystal display (LCD) panel in place of a reticle are largely solved by a new breakthrough method. LCD matrix exposure is effective for small volume productions of print circuits, screen masks, micromachine parts, and other items. Since no reticles are needed, all reticle costs are saved, and turnaround times required for changing the patterns are greatly shortened. However, in the conventional method, pattern widths and positions were strictly restricted depending on the geometric size and pitch of the liquid crystal cells. In this paper, a new concept appointing the cell brightness grades continuously using an analogue interface LCD panel is proposed. Calculating the image intensity distributions for various appointments of cell brightness balances to print same wide patterns, it is clarified that the pattern widths and positions are not much different if the pattern widths are wider than 2 cell pitches of the LCD panel. Maximum width and position variations are less than ± 10% even when the patterns are printed at arbitrary positions, of course including halfway ones. The calculated results are proved by experiments using an analogue LCD panel with a cell pitch of 15 μm. Though the cell size are 13 × 10 μm2, and different in x and y directions, almost same wide line-and-space patterns are successfully printed at all positions by only one exposure. It is not necessary to shift the reticle for overlapping exposures to print smooth patterns. Oblique patterns and complicated Chinese character patterns are also printed at arbitrary positions. The new breakthrough technology will make the LCD matrix exposure promising for wide uses of printing various rough patterns easily at small costs.

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References

  1. T. Horiuchi T. Miyakawa S. Hosoda (2000) Jpn. J. Appl. Phys. 39 324 Occurrence Handle10.1143/JJAP.39.324 Occurrence Handle2000JaJAP..39..324H

    Article  ADS  Google Scholar 

  2. K. Nakamura H. Kubota A. Nakada T. Inokuchi K. Kosaka (2002) Proc. SPIE 4754 737 Occurrence Handle10.1117/12.476958 Occurrence Handle2002SPIE.4754..736N

    Article  ADS  Google Scholar 

  3. T. Morimoto K. Nakamura H. Kubota A. Nakada T. Akamichi T. Inokuchi K. Kosaka (2003) Proc. SPIE 5130 347 Occurrence Handle10.1117/12.504264 Occurrence Handle2003SPIE.5130..347M

    Article  ADS  Google Scholar 

  4. S. Singh-Gasson R. D. Green Y. Yue C. Nelson F. Blattner M. R. Sussman F. Cerrina (1999) Nat. Biotechnol. 17 974 Occurrence Handle10.1038/13664

    Article  Google Scholar 

  5. K. Takahashi J. Setoyama (1999) Trans. IEICE J82-C-II 92

    Google Scholar 

  6. T. Akabane K. Takahashi (2001) Trans. IEE Japan 121-E 275

    Google Scholar 

  7. Y. Ohtsubo M. Yamamoto S. Tadokoro T. Takamori (2003) Trans. IEE Jpn. 119-E 247

    Google Scholar 

  8. T. Horiuchi S. Aichi Y. Kawamura (2003) Jpn. J. Appl. Phys. 42 1820 Occurrence Handle10.1143/JJAP.42.1820 Occurrence Handle2003JaJAP..42.1820H

    Article  ADS  Google Scholar 

  9. T. Horiuchi N. Mirumachi Y. Ohshima (2006) Dig. Pap. Microprocess. Nanotechnol. 2006 338

    Google Scholar 

  10. T. Horiuchi H. Kobayashi (2004) Jpn. J. Appl. Phys. 43 394 Occurrence Handle10.1143/JJAP.43.394 Occurrence Handle2004JaJAP..43..394H

    Article  ADS  Google Scholar 

  11. T. Horiuchi H. Kobayashi (2004) Microelectron. Eng. 73-74 48 Occurrence Handle10.1016/S0167-9317(04)00071-1

    Article  Google Scholar 

  12. T. Horiuchi and A. Otani., Tech. Dig. 5th Int. Conf. Optics-Photonics Design & Fabrication, ODF'06, Nara (2006). 193

  13. H. Kubota (1971) Hado Kogaku Wave Motion Optics Iwanami Tokyo 289

    Google Scholar 

  14. S. Moriguchi Y. Udagawa S. Ichimatsu (1957) Sugaku Koshiki II Mathematical Formulas II Iwanami Tokyo viii–xii

    Google Scholar 

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Horiuchi, T., Otani, A. Matrix Projection Exposure Using an Analogue Liquid Crystal Display Panel in Place of a Reticle. OPT REV 14, 224–230 (2007). https://doi.org/10.1007/s10043-007-0224-9

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  • DOI: https://doi.org/10.1007/s10043-007-0224-9

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