Abstract
The reverse depth profile analysis is a recently developed method for the study of a deposit composition profile in the near-substrate zone. The sample preparation technique enables one to separate the deposit and a thin cover layer from its substrate, and the initial roughness of the sample is much smaller than in the conventional sputtering direction. This technique is particularly suitable to study the zones being formed in the early phase of the electrodeposition of alloys. It has been demonstrated with the reverse depth profile analysis that in many cases when one component of an alloy is preferentially deposited, an initial zone is formed that is rich in the preferentially deposited component. This phenomenon is demonstrated for Ni–Cd, Ni–Sn, Fe–Co–Ni, Co–Ni, and Co–Ni–Cu alloys. The composition change is confined to the initial 150-nm-thick deposit, and it is the result of the interplay of the deposition preference and the depletion of the electrolyte near the cathode with respect to the ion reduced preferentially. The reverse depth profile analysis made it possible to compare the measured and the calculated composition depth profile of electrodeposited multilayers. It has been shown that the decay in the composition oscillation intensity in Co/Cu multilayers with the increase of the sputtering depth can be derived from the roughness measured as a function of the deposit thickness.
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Hightower A, Koel B, Felter T (2009) Electrochim Acta 54:1777–1783
Palacio C, Ocón P, Herrasti P, Díaz D, Arranz A (2003) J Electroanal Chem 545:53–58
Kossoy E, Khoptiar Y, Cytermann C, Shemesh G, Katz H, Sheinkopf H, Cohen I, Eliaz N (2008) Corros Sci 50:1481–1491
Stangl M, Acker J, Oswald S, Uhlemann M, Gemming T, Baunack S, Wetzig K (2007) Microel Eng 84:54–59
Favry E, Frederich N, Meunier A, Omnes L, Jomard F, Etcheberry A (2008) Electrochim Acta 53:7004–7011
Martín AJ, Chaparro AM, Gallardo B, Folgado MA, Daza L (2009) J Power Sources 192:14–20
Bardi U, Caporali S, Chenakin SP, Lavacchi A, Miorin E, Pagura C, Tolstogouzov A (2006) Surf Coat Technol 200:2870–2874
Nakanishi S, Sakai S, Nagai T, Nakato Y (2005) J Phys Chem B 109:1750–1755
Padhi D, Gandikota S, Nguyen HB, McGuirk C, Ramanathan S, Yahalom J, Dixit G (2003) Electrochim Acta 48:935–943
Gómez E, Pllicier E, Vallés E (2003) J Appl Electrochem 33:245–252
Dulal SMSI, Yun HJ, Shin CB, Kim CK (2009) Appl Surf Sci 255:5795–5801
Koo HC, Cho SK, Kwon OJ, Suh MW, Im Y, Kim JJ (2009) J Electrochem Soc 156:D236–D241
Pisarek M, Janik-Czachor M, Donten M (2008) Surf Coat Technol 202:1980–1984
Sakai S, Nakanishi S, Nakato Y (2006) J Phys Chem B 110:11944–11949
Shimizu K, Brown GM, Habazaki H, Kobayashi K, Skeldon P, Thompson GE, Wood GC (2001) Corros Sci 43:199–205
Egberts P, Brodersen P, Hibbard GD (2006) Mat Sci Eng A 441:336–341
Ahadian MM, Irajizad A, Nouri E, Ranjbar M, Dolati A (2007) J Alloy Comp 443:81–86
Ranjbar M, Ahadian MM, Irajizad A, Dolati A (2006) Mat Sci Eng B 127:17–21
Angeli J, Kaltenbrunner T, Androsch (1991) Fresenius J Anal Chem 341:140–144
Csik A, Vad K, Tóth-Kádár E, Péter (2009) Electrochem Commun 11:1289–1291
Péter L, Csik A, Vad K, Tóth-Kádár E, Pekker Á, Molnár G (2010) Electrochim Acta 55:4734–4741
Iselt D, Gaitzsch U, Oswald S, Fähler S, Schultz L, Schlörb H (2011) Electrochim Acta 56:5178–5183
Leistner K, Thomas J, Baunack S, Schlörb H, Schultz L, Fähler S (2005) J Magn Magn Mater 290–291:1270–1273
Lukaszewski M, Klimek K, Czerwinski A (2009) J Electroanal Chem 637:13–20
Papadimitriou S, Armyanov S, Valova E, Hubin A, Steenhaut O, Pavlidou E, Kokkinidis G, Sotiropoulos S (2010) J Phys Chem C 114:5217–5223
Gupta D, Nayak AC, Sharma M, Singh RR, Kulkarni SK, Pandey RK (2006) Thin Solid Films 513:187–192
Péter L, Katona GL, Berényi Z, Vad K, Langer GA, Tóth-Kádár E, Pádár J, Pogány L, Bakonyi I (2007) Electrochim Acta 53:837–845
Katona GL, Berényi Z, Péter L, Vad K (2008) Vacuum 82:270–273
Bartók A, Csik A, Vad K, Molnár G, Tóth-Kádár E, Péter L (2009) J Electrochem Soc 156:D253–D260
Csik A, Vad K, Langer GA, Katona GL, Tóth-Kádár E, Péter L (2010) Vacuum 84:141–143
Hernández-Vélez M, Pirota KL, Pászti F, Navas D, Climent A, Vázquez M (2005) Appl Phys A 80:1701–1706
Vázquez M, Hernández-Vélez M, Pirota K, Asenjo A, Navas D, Velázquez J, Vargas P, Ramos C (2004) Eur Phys J B 40:489–497
Singh S, Basu S, Ghosh SK (2009) Appl Surf Sci 255:5910–5916
Takahashi M, Kojima M, Sato S, Ohnisi N, Nishiwaki A, Wakita K, Miyuki T, Ikeda S, Muramatsu Y (2004) J Appl Phys 96:5582–5587
Kang SH, Kim YK, Choi DS, Sung YE (2006) Electrochim Acta 51:4433–4438
Calixto ME, Sebastian PJ (2000) Solar Energy Materials & Solar Cells 63:335–345
Nauer M, Ernst K, Kautek W, Neumann-Spallart M (2005) Thin Solid Films 489:86–93
Rogers KD, Wood DA, Painter JD, Lane DW, Ozsan ME (2000) Thin Solid Films 361–362:234–238
Seipel B, Nadarajah A, Wutzke B, Könenkamp R (2009) Mater Lett 63:736–738
Lu M, Cheng H, Yang Y (2008) Electrochim Acta 53:3539–3546
Cheng H, Zhu C, Lu M, Yang Y (2007) J Power Sources 173:531–537
Saito Y, Rahman MK (2007) J Power Sources 174:877–882
Kowalski D, Aoki Y, Habazaki H (2009) Angew Chem Int Ed 48:7582–7585, Supporting information
Shimizu K, Habazaki H, Skeldon P, Thompson GE, Wood GC (2000) Electrochim Acta 45:1805–1809
Benzakour J, Derja A (1997) J Electroanal Chem 437:119–124
Crossland AC, Thompson GE, Smith CJE, Habazaki H, Shimizu K, Skeldon P (1999) Corros Sci 41:2053–2069
Wener Z, Jaskiewicz A, Pisarek M, Janik-Czachor M, Barlak M (2005) Z Phys Chem 219:1461–1479
Suleiman A, Hashimoto T, Skeldon P, Thompson GE, Echeverria F, Graham MJ, Sproule GI, Moisa S, Habazaki H, Bailey P, Noakes TCQ (2008) Corr Sci 50:1353–1359
Cho EA, Ahn SJ, Kwon HS (2005) Electrochim Acta 50:3383–3389
Mohanty US, Lin KL (2007) J Mater Res 22:2573–2581
Sziráki L, Cziráki A, Vértesy, Kiss L, Ivanova V, Raichevski G, Vitkova S, Marinova S (1999) J Appl Electrochem 29:927–937
Janik-Czachor M, Pisarek M (2009) In: Pyun SI, Lee JW (eds) Modern aspects of electrochemistry 46, Chapter 3. New York, Springer, pp 175–230
Sosa E, Cabrera-Sierra R, Oropeza MT, Hernández F, Casillas N, Tremont R, Cabrera C, González I (2003) Electrochim Acta 48:1665–1674
Kowalski D, Ueda M, Ohtsuka T (2007) Corros Sci 49:3442–3452
Kazeminezhad I, Blythe HJ, Schwarzacher W (2001) Appl Phys Lett 78:1014–1016
Kazeminezhad I, Schwarzacher W (2001) J Magn Magn Mater 226:1650–1652
Kazeminezhad I, Schwarzacher W (2002) J Magn Magn Mater 240:467–468
Kazeminezhad I, Schwarzacher W (2004) J Solid State Electrochem 8:187–189
Massalski TB (ed) (1996) Binary alloy phase diagrams, second edition plus updates on CD-ROM. ASM International, Materials Park
Mohanty US, Tripathy BC, Singh P, Das SC (2004) J Electroanal Chem 566:47–52
Mohanty US, Tripathy BC, Singh P, Das SC (2002) J Electroanal Chem 526:63–68
Liu X, Zangari G, Shen L (2000) J Appl Phys 87:5410–5412
Tabakovich I, Inturi V, Riemer S (2002) J Electrochem Soc 149:C18–C22
Perez L, Attenborough K, De Boeck J, Celis JP, Aroca C, Sánchez P, López E, Sánchez MC (2002) J Magn Magn Mater 242–245:163–165
Liu X, Zangari G, Shamsuzzoha M (2003) J Electrochem Soc 150:C159–C168
Van Cittert PH (1931) Z Phys 69:298
Escobar Galindo R, Albella JM (2008) Spectrochim Acta B 63:422–430
Escobar Galindo R, Forniés E, Albella JM (2005) J Anal At Spectrom 20:116–1120
Acknowledgments
K. Neuróhr and L. Péter acknowledge Prof. György Inzelt for his support and his outstanding activity in the education of electrochemistry. The present work was funded by the Hungarian Scientific Research Fund (OTKA) through grant # NN 79846.
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Neuróhr, K., Csik, A., Vad, K. et al. Composition depth profile analysis of electrodeposited alloys and metal multilayers: the reverse approach. J Solid State Electrochem 15, 2523–2544 (2011). https://doi.org/10.1007/s10008-011-1465-x
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DOI: https://doi.org/10.1007/s10008-011-1465-x