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Nitrogen-doped TiO2 mesosponge layers formed by anodization of nitrogen-containing Ti alloys

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Abstract

An alloy containing 5 at.% of N was produced by arc melting of Ti and TiN powders. By anodization of the alloy in a 10 wt.% K2HPO4/glycerol electrolyte at 140 °C, oxide mesosponge layers can be formed with thickness as up to several micrometers. X-ray photoelectron spectroscopy confirms nitrogen uptake in the oxide. Photoelectrochemical measurements show successful N-doping of these mesoporous anodic layers with a significant visible light photoresponse.

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Acknowledgments

The authors would like to acknowledge DFG and the Erlangen DFG Cluster of Excellence for financial support, and Helga Hildebrand for valuable technical help.

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Authors and Affiliations

  1. Department of Materials Science, WW4-LKO, University of Erlangen-Nuremberg, Martensstr. 7, 91058, Erlangen, Germany

    Doohun Kim, Felix Schmidt-Stein & Patrik Schmuki

  2. Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka, 565-0871, Japan

    Hiroaki Tsuchiya & Shinji Fujimoto

Authors
  1. Doohun Kim
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  2. Hiroaki Tsuchiya
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  3. Shinji Fujimoto
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  4. Felix Schmidt-Stein
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  5. Patrik Schmuki
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Corresponding author

Correspondence to Patrik Schmuki.

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Kim, D., Tsuchiya, H., Fujimoto, S. et al. Nitrogen-doped TiO2 mesosponge layers formed by anodization of nitrogen-containing Ti alloys. J Solid State Electrochem 16, 89–92 (2012). https://doi.org/10.1007/s10008-010-1282-7

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  • DOI: https://doi.org/10.1007/s10008-010-1282-7

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