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Effects of SO 2−4 , S2O 2−3 and HSO 4 ion additives on the pitting corrosion of pure aluminium in 1 M NaCl solution at 40–70 °C

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Abstract

Effects of sulphate (SO 2−4 ), thiosulphate (S2O 2−3 ) and hydrogensulphate (HSO 4 ) ion additives on the pitting corrosion of pure aluminium in 1 M NaCl solution have been investigated at various solution temperatures Ts, 40–70 °C using potentiodynamic polarisation experiment, double current step experiment and scanning electron microscopy (SEM). From the analysis of the galvanostatic potential transients obtained from the double current step experiment, it was suggested that both SO 2−4 and S2O 2−3 ions retard the initiation of the etch pits, and that they also inhibit the passivation of the etch pits during the current interruption to promote the subsequent re-activation of the etch pits over the whole range of Ts. In contrast, it was found that HSO 4 ions promote the initiation of the etch pits and at the same time, they enhance the passivation of the etch pits during the current interruption with rising Ts. From the SEM micrographs, it was revealed that as Ts increased the pit morphology changed from circular shape to irregular shape with rough surface in the presence of SO 2−4 or S2O 2−3 ions, but it changed to strip-like shape in the presence of HSO 4 ions. The beneficial effects of anion additives on the increase in surface area were discussed on the basis of the morphological change of the etch pits in the presence of anion additives.

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Acknowledgements

The receipt of a research grant (grant No. R01-2000-000-00240-0) from Korea Science and Engineering Foundation is gratefully acknowledged. Incidentally, this work was partly supported by the Brain Korea 21 project. The authors are indebted to Dr. J.-W. Lee in the corrosion and interfacial electrochemistry research laboratory at KAIST for his helpful discussion.

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Correspondence to Su-Il Pyun.

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Na, KH., Pyun, SI. Effects of SO 2−4 , S2O 2−3 and HSO 4 ion additives on the pitting corrosion of pure aluminium in 1 M NaCl solution at 40–70 °C. J Solid State Electrochem 9, 639–645 (2005). https://doi.org/10.1007/s10008-004-0629-3

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  • DOI: https://doi.org/10.1007/s10008-004-0629-3

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