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Self-etching aspects of a three-step etch-and-rinse adhesive

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Abstract

Purpose

The purpose of this study is to assess the marginal adaptation of cavities restored with a three-step etch-and-rinse adhesive, OptiBond FL (OFL) under different application protocols.

Materials and methods

Twenty-four class V cavities were prepared with half of the margins located in enamel and half in dentin. Cavities were restored with OFL and a microhybrid resin composite (Clearfil AP-X). Three groups (n = 8) that differed in the etching technique were tested with thermomechanical loading, and specimens were subjected to quantitative marginal analysis before and after loading. Micromorphology of etching patters on enamel and dentin were observed with SEM. Data was evaluated with Kruskal–Wallis and Bonferroni post hoc test.

Results

Significantly lower percent CM (46.9 ± 19.5) were found after loading on enamel in group 3 compared to group 1 (96.5 ± 5.1) and group 2 (93.1 ± 8.1). However, no significant differences (p = 0.30) were observed on dentin margins.

Conclusions

Etching enamel with phosphoric acid but avoiding etching dentin before the application of OFL, optimal marginal adaptation could be obtained, evidencing a self-etching primer effect.

Clinical relevance

A reliable adhesive interface was attained with the application of the three-step etch-and-rinse OFL adhesive with a selective enamel etching, representing an advantage on restoring deep cavities.

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Acknowledgments

The authors wish to express their gratitude to Marie-Claude Raymond for the help with the SEM evaluation.

Conflict of interest statement

The authors declare that they have no conflict of interest.

Author information

Authors and Affiliations

  1. Department of Operative Dentistry and Endodontics, International University of Catalonia, Sant Cugat del Valles, 08195, Barcelona, Spain

    Jose Bahillo

  2. Department of Operative Dentistry and Endodontics, School of Dentistry, International University of Catalonia, Sant Cugat del Valles, 08195, Barcelona, Spain

    Miguel Roig

  3. Division of Cariology and Endodontology, School of Dentistry, University of Geneva, Rue Barthelemy-Menn, 19, 1205, Geneva, Switzerland

    Tissiana Bortolotto

  4. Division of Cariology and Endodontology, School of Dentistry, University of Geneva, Rue Barthelemy-Menn, 19, CH-1205, Geneva, Switzerland

    Ivo Krejci

Authors
  1. Jose Bahillo
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  2. Miguel Roig
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  4. Ivo Krejci
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Corresponding author

Correspondence to Jose Bahillo.

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Bahillo, J., Roig, M., Bortolotto, T. et al. Self-etching aspects of a three-step etch-and-rinse adhesive. Clin Oral Invest 17, 1893–1900 (2013). https://doi.org/10.1007/s00784-012-0878-y

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  • DOI: https://doi.org/10.1007/s00784-012-0878-y

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