Abstract
Paramagnetic properties of two series of polymorphous silicon thin films deposited by plasma-enhanced chemical vapor deposition with variation of silane and hydrogen gas mixture pressure and substrate temperature have been studied by means of electron paramagnetic resonance (EPR) spectroscopy. For the first time EPR signal with g-tensor values g 1 = 1.9984, g 2 = 1.9890, g 3 = 1.9790 was detected in the polymorphous silicon structure. We have attributed this signal to the electrons trapped in conduction band tail states at the interface between nanocrystals and/or at the grain boundaries between silicon nanocrystals. An activation energy of electron transition from band tail states to the conduction band was estimated approximately to 40 meV. Observed changes of the paramagnetic center concentration vs substrate temperature and gas pressure in the reaction chamber during polymorphous silicon film preparation are discussed.
Similar content being viewed by others
References
P. Roca i Cabarrocas, A. Fontcuberta i Morral, Y. Poissant, Thin Solid Films 403–404, 39–46 (2002)
J.P. Kleider, P. Roca i Cabarrocas, J. Non-Cryst. Solids 299–302, 599–604 (2002)
A.G. Kazanskii, G. Kong, X. Zeng, H. Hao, F. Liu, J. Non-Cryst. Solids 354, 2282–2285 (2008)
M.Y. Soro, M.E. Gueunier-Farret, J.P. Kleider, J. Appl. Phys. 109, 023713 (2011)
A.V. Emelyanov, E.A. Konstantinova, P.A. Forsh, A.G. Kazanskii, M.V. Khenkin, N.N. Petrova, E.I. Terukov, D.A. Kirilenko, N.A. Bert, S.G. Konnikov, P.K. Kashkarov, JETP Lett. 97(8), 466–469 (2013)
M.Y. Soro, M.E. Gueunier-Farret, J.P. Kleider, J. Appl. Phys. 109, 023713 (2011)
M. Brinza, G.J. Adriaenssens, P. Roca i Cabarrocas, Thin Solid Films 427, 123 (2003)
K.H. Kim, E.V. Johnson, P. Roca, Solar Energy Mater. Solar Cells 105, 208–212 (2012)
F. Finger, J. Muller, C. Malten, R. Carrius, H. Wagner, J. Non-Cryst. Solids 266–269, 511–518 (2000)
J.C. Knights, D.K. Biegelsen, I. Solomon, Solid State Commun. 22, 133–137 (1977)
K. Morigaki, C. Niikura, J.E. Bouree, B. Equer, J. Non-Cryst. Solids 299–302, 561–565 (2002)
K. Takeda, K. Morigaki, H. Hikita, P. Roca i Cabarrocas, J. Appl. Phys. 104, 053715 (2008)
M.H. Brodsky, Amorphous Semiconductors (Springer-Verlag, Berlin-Heldelberg New York, 1979)
E.A. Konstantinova, B.V. Kamenev, P.K. Kashkarov, V.Kh. Kudojarova, E.I. Terukov, V.Yu. Timoshenko, J. Non Cryst. Solids 282(2–3), 321–324 (2001)
S. Livraghi, A. Votta, M.C. Paganini, E. Giamello, Chem. Comm. 498–500 (2005)
S.K. Mistra, S.I. Andronenko, K.M. Reddy, J. Hays, A. Punnoose, J. Appl. Phys. 99, 08M106-1 -08M106-3 (2006)
F. Finger, J. Muller, C. Malten, R. Carrius, H. Wagner, J. Non-Cryst. Solids 266–269, 511–518 (2000)
M.M. Lima, Jr.C. Taylor, P.C. Taylor, S. Morrison, A. LeGeune, F. C. Marques, Phys. Rev. B 65, 235324-1–235324-6 (2002)
K.G. Kiriluk, J.D. Fields, B.J. Simonds, Y.P. Pai, P.L. Miller, T. Su, B. Yan, J. Yang, S. Guha, A. Madan, S.E. Shaheen, P.C. Taylor, R.T. Collins, Appl. Phys. Lett. 102, 133101 (2013)
E.A. Konstantinova, V.A. Demin, P.K. Kashkarov, in Nanocrystal, ed. by Y. Masuda, Chapt. 12 (InTech, Rijeka, 2011), pp. 313–348
M. Hoheisel, R. Carius, W. Fuhs, J. Non-Cryst. Solids 59–60, 457–460 (1983)
Acknowledgments
This work was supported by the Ministry of Education and Science of the Russian Federation (no 14.604.21.0085; Identification number RFMEFI60414 X 0085). We are grateful to Prof. P. Roca i Cabarrocas (Ecole polytechnique, France) for the sample preparation. The measurements has been done using the facilities of the Collective Use Center at the Moscow State University.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Konstantinova, E.A., Emelyanov, A.V., Forsh, P.A. et al. Influence of Formation Conditions on Structure and Properties of Paramagnetic Centers in Polymorphous Silicon Films. Appl Magn Reson 47, 693–700 (2016). https://doi.org/10.1007/s00723-016-0772-x
Received:
Revised:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00723-016-0772-x