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Segregation of organic impurities in thin electroplated Cu metallizations

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Abstract.

This article presents investigations regarding the incorporation of organic impurities in thin electroplated Cu metallizations. RF-GD-OES (radio frequency glow discharge optical emission spectrometry) was used for detection of C and H as indicators for incorporated hydrocarbon molecules. The presented results indicate a fragmentation of incorporated hydrocarbons and their constrict segregation near the Cu surface. The bilateral relationship between incorporated organic impurities and intrinsic stress behavior is associated with the Gorky effect.

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Correspondence to Marcel Stangl.

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Stangl, M., Acker, J., Hoffmann, V. et al. Segregation of organic impurities in thin electroplated Cu metallizations. Microchim Acta 156, 159–162 (2006). https://doi.org/10.1007/s00604-006-0606-x

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  • DOI: https://doi.org/10.1007/s00604-006-0606-x

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