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Quantitative nitrogen analysis by Auger electron spectrometry and glow discharge optical emission spectrometry

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Abstract.

Nitrides of refractory metals are investigated as diffusion barriers for Cu metallization. The composition, thermal stability and inter diffusion in layered systems are characterized by depth profile analysis. For the quantification of depth profiles determination of sensitivity factors is essential. For nitrogen and other light elements matrix specific standards are often not available and compound standards are used for calibration. We have investigated the systems Ta–N and Ta–Si–N and for comparison Cr–N by means of Auger electron spectrometry (AES) and glow discharge optical emission spectrometry (GDOES). A non-linear calibration curve for the N/Cr intensity ratio was observed with GDOES in the Cr–N-system, probably caused by self-absorption of the Cr line.

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Authors and Affiliations

  1. IFW Dresden, Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden, Postfach 270116, D-01171, Dresden, Germany

    Stefan Baunack & Volker Hoffmann

  2. Westsächsische Hochschule Zwickau, Fachbereich Physikalische Technik/Informatik, Postfach 201037, D-08012, Zwickau, Germany

    Wieland Zahn

Authors
  1. Stefan Baunack
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  2. Volker Hoffmann
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  3. Wieland Zahn
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Correspondence to Stefan Baunack.

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Baunack, S., Hoffmann, V. & Zahn, W. Quantitative nitrogen analysis by Auger electron spectrometry and glow discharge optical emission spectrometry. Microchim Acta 156, 69–72 (2006). https://doi.org/10.1007/s00604-006-0587-9

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  • DOI: https://doi.org/10.1007/s00604-006-0587-9

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