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Monitoring the Quality of Ultra-Pure Water in the Semiconductor Industry by Online Ion Chromatography

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Abstract.

To manufacture 300 mm wafers, large quantities of ultra-pure water are required, which makes water the most important chemical used in this process. Therefore, its specification requiring ionic contaminants in the lower pg mL−1-concentration range is very strict. While inductively coupled plasma mass spectrometry (ICP-MS) is widely used for monitoring inorganic cations, ion chromatography (IC) is applied in the determination of ammonium and inorganic anions in the lower pg mL−1 range.

For routine monitoring of both ammonium and inorganic cations and inorganic anions in the lower pg mL−1 range with online IC, gradient conditions were developed using the simulation software DryLab2000. The resulting methods were subsequently validated. The limit of quantification for a concentrated sample volume of 200 mL was statistically assessed at 1–2 pg mL−1 for ammonium and some alkaline/earth alkaline cations, and at 5–10 ng L−1 for inorganic anions, respectively.

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Authors and Affiliations

  1. Central Analytical Department, Wacker Chemie GmbH, Johannes-Hess-Straße 24, D-84489, Burghausen, Germany

    Thomas Ehmann

  2. Department of Metrology, Siltronic AG Freiberg, Berthelsdorfer Straße 113, D-09599, Freiberg, Germany

    Claus Mantler

  3. Dionex GmbH, Am Wörtzgarten 10, D-65510, Idstein, Germany

    Detlef Jensen & Ralf Neufang

Authors
  1. Thomas Ehmann
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  2. Claus Mantler
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  3. Detlef Jensen
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  4. Ralf Neufang
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Correspondence to Claus Mantler.

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Ehmann, T., Mantler, C., Jensen, D. et al. Monitoring the Quality of Ultra-Pure Water in the Semiconductor Industry by Online Ion Chromatography. Microchim Acta 154, 15–20 (2006). https://doi.org/10.1007/s00604-005-0427-3

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  • DOI: https://doi.org/10.1007/s00604-005-0427-3

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