Abstract
This paper investigates to find a method to improve the design parameters such as drain current, transconductance, cut off frequency and most importantly minimum noise figure of the Nitride HEMTs. Firstly, to improve the performance of the Nitride HEMT, the AlGaN barrier with high Al fraction was used. Owing to its higher carrier density at higher Al fraction, AlGaN/GaN HEMT exhibited higher drain current, higher transconductance. It also results in a lower minimum noise figure. But, the increase of Al in barrier leads to a lattice mismatch of barrier layer with GaN channel layer. Thus, In0.17Al0.83N barrier layer which is lattice matched to GaN is used instead of traditionally popular AlGaN. Along with a change of material of the barrier layer, a change of material of the channel layer shows improvement in DC & RF response and most importantly in the minimum noise figure when InGaN replaces GaN. The noise performance has been further improved with the T-shaped gate by reducing the gate resistance. All the theoretical analyses have been supported and verified by the results obtained from simulation carried out using Silvaco TCAD tool.
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References
Chabak KD et al (2011) High-performance AlN/GaN HEMTs on sapphire substrate with an oxidized gate insulator. IEEE Electron Device Lett 32(12):1677–1679. https://doi.org/10.1109/LED.2011.2167952
Che CH et al (2016) The causes of GaN HEMT bell-shaped transconductance degradation. Solid-State Electr 126:115–124. https://doi.org/10.1016/j.sse.2016.09.005
Chen Y, Guo Y, Huang W, Xu R (2010) The microwave noise characteristics of InAlN/GaN HEMTs. In: 2010 international conference on microwave and millimeter wave technology. https://doi.org/10.1109/icmmt.2010.5524738
Denbaars S, Mishra UK, Singh J (2000) Charge control and mobility in AlGaN/GaN transistors: experimental and theoretical studies. J Appl Phys 87(11):7981–7987. https://doi.org/10.1063/1.373483
Gonschorek M, Carlin J-F, Feltin E, Py MA, Grandjean N (2006) High electron mobility lattice-matched AlInN/GaN field-effect transistor heterostructures. Appl Phys Lett 89(6):062106. https://doi.org/10.1063/1.2335390
Goyal N, Fjeldly TA (2016) Determination of surface donor states properties and modeling of InAlN/AlN/GaN heterostructures. IEEE Trans Electron Devices 63(2):881–885
Goyal N, Tor AF (2016) Determination of surface donor states properties and modeling of InAlN/AlN/GaN heterostructures. IEEE Trans Electron Devices. https://doi.org/10.1109/TED.2015.2510427
Jiang HX, Lin JY (2002) AlGaN and InAlGaN alloys-epitaxial growth, optical and electrical properties, and applications. Optoelectr Rev 4:271–286
Lenka TR, Panda AK (2011) Characteristics study of 2DEG transport properties of AlGaN/GaN and AlGaAs/GaAs-based HEMT. Semiconductors 45(5):650–656
Lenka TR, Dash GN, Panda AK (2012) A comparative 2DEG study of InxAl1-xN/(In, Al, Ga) N/GaN-based HEMTs. Phys Procedia 25:36–43
Lin Y-S, Lu C-C (2018) Improved AlGaN/GaN metal–oxide—semiconductor high-electron mobility transistors with TiO2 gate dielectric annealed in nitrogen. IEEE Trans Electron Devices 65(2):783–787. https://doi.org/10.1109/ted.2017.2781141
Liu X, Gu H, Li K, Guo L, Zhu D, Lu Y et al (2017) AlGaN/GaN high electron mobility transistors with a low sub-threshold swing on free-standing GaN wafer. AIP Adv 7(9):095305. https://doi.org/10.1063/1.4999810
Lu W, Kumar V, Piner EL, Adesida I (2003) DC, RF, and microwave noise performance of AlGaN-GaN field effect transistors dependence of aluminum concentration. IEEE Trans Electron Devices 50(4):1069–1074. https://doi.org/10.1109/ted.2003.812083
Luo X, Halder S, Curtice WR, Hwang JCM, Chabak KD, Walker DE, Dabiran AM (2011) Scaling and high-frequency performance of AlN/GaN HEMTs. 2011 IEEE International Symposium on Radio-Frequency Integration Technology. https://doi.org/10.1109/rfit.2011.6141776
Mishra UK, Parikh P, Yi-Feng W (2002) AlGaN/GaN HEMTs-an overview of device operation and applications. Proc IEEE 90(6):1022–1031
Neuburger M, Zimmermann T, Kohn E, Dadgar A, Schulze F, Krtschil A, Daumiller I (2005) Unstrained InAlN/GaN HEMT structure. High Perform Dev. https://doi.org/10.1142/S0129156404002831
Oxley C (2001) Calculation of minimum noise figure using the simple Fukui equation for gallium nitride (GaN) HEMTs. Solid-State Electron 45(5):677–682. https://doi.org/10.1016/s0038-1101(01)00069-7
Pal S, Jacob C (2004) Silicon—a new substrate for GaN growth. Bull Mater Sci 27(6):501–504
Palacios T et al (2005) Influence of the dynamic access resistance in the gm and fT linearity of AlGaN/GaN HEMTs. IEEE Trans Electron Devices 52(10):2117–2123
Sengupta A, Islam A (2018) Comparative analysis of AlGaN/GaN high electron mobility transistor with sapphire and 4H-SiC substrate. Microsyst Technol. https://doi.org/10.1007/s00542-018-3903-5
Sze SM, Ng KK (2007) Physics of semiconductor devices. Wiley, Hoboken
Tsividis Y (2010) Operation and modelling of the MOS transistor, 2nd edn. Oxford University Press, New York
Wang GW et al (1988) Reduction of gate resistance in tenth-micron gate MODFETs for microwave applications. Solid-state Electron 31(8):1247–1250. https://doi.org/10.1016/0038-1101(88)90422-4
Silvaco TCAD Software. http://www.silvaco.com
Yadav YK et al. (2018) Reduced contact resistance and improved transistor performance by surface plasma treatment on ohmic regions in AlGaN/GaN HEMT heterostructures. Physicastatus solidi. https://doi.org/10.1002/pssa.201700656
Zhang S, Li MC, Feng ZH, Liu B, Yiu JY, Zhao LC (2009) High electron mobility and low sheet resistance in lattice-matched AlInN/AlN/GaN/AlN/GaN double-channel heterostructure. Appl Phys Lett 95:212101
Zhang XW et al (2013) AlNGaN HEMT T-gate optimal design. Appl Mech Mater. 347:1. https://doi.org/10.2991/isccca.2013.23
Zhang Y et al (2018) InGaN-channel high-electron-mobility transistor with enhanced linearity and high-temperature performance. Appl Phys Express 11(9):094101. https://doi.org/10.7567/APEX.11.094101
Acknowledgements
This material is based on work supported by Defence Research and Development Organisation (DRDO) under Sanction letter no. ERIP/ER/DG-MED &CoS/990216301/M/01/1675 dated 04 July 2017. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the DRDO.
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Sinha, K., Dubey, S.K. & Islam, A. Study of high Al fraction in AlGaN barrier HEMT and GaN and InGaN channel HEMT with In0.17Al0.83N barrier. Microsyst Technol 26, 2145–2158 (2020). https://doi.org/10.1007/s00542-019-04466-4
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DOI: https://doi.org/10.1007/s00542-019-04466-4