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Fabrication of 3-D PTFE microstructures utilising change of etching rate with respect to exposure time

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Abstract

In this study, we fabricated three-dimensional (3-D) polytetrafluoroethylene (PTFE) microstructures using the plane-pattern to cross-section transfer (PCT) method with synchrotron radiation (SR) ablation. We found that the etching rate increased with increasing SR exposure. This was attributed to the heating of the PTFE surface as evidenced by the emission of fluorocarbon gas from the surface. Using the PCT method, we successfully produced various 3-D PTFE microstructure shapes by varying the energy distribution of the SR exposure using multiple scanning speeds.

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Acknowledgments

We would like to thank Mr. Hiroyuki Ikeda, who is a technician at the SR center of Ritsumeikan University, for his technical assistance.

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Correspondence to Mitsuhiro Horade.

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Horade, M., Sugiyama, S. Fabrication of 3-D PTFE microstructures utilising change of etching rate with respect to exposure time. Microsyst Technol 19, 351–356 (2013). https://doi.org/10.1007/s00542-012-1605-y

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  • DOI: https://doi.org/10.1007/s00542-012-1605-y

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